Chemical vapor deposition of Al2O3 films using highly volatile single sources

Thin Solid Films

Volumn 304, Issue 1-2, 1997, Pages 222-224

  Koh, Wonyong ^a   Ku, Su Jin ^a   Kim, Yunsoo ^a  

^a Korea Research Institute of Chemical Technology   (South Korea)

Author keywords

Aluminum oxide; Chemical vapor deposition; Depth profiling; Organometallic vapor deposition

Indexed keywords

ALUMINA; AUGER ELECTRON SPECTROSCOPY; FILM GROWTH; METALLORGANIC CHEMICAL VAPOR DEPOSITION; ORGANOMETALLICS; PRESSURE EFFECTS; SCANNING ELECTRON MICROSCOPY; SILICON; SUBSTRATES; THERMAL EFFECTS; X RAY DIFFRACTION ANALYSIS; X RAY PHOTOELECTRON SPECTROSCOPY;

AUGER DEPTH PROFILING; DIETHYLALUMINUM ISOPROPOXIDE; DIMETHYLALUMINUM ISOPROPOXIDE; DIMETHYLALUMINUM TERTBUTOXIDE;

AMORPHOUS FILMS;

EID: 0031187493     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0040-6090(97)00132-6     Document Type: Article

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