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Volumn 498, Issue 1-2, 2006, Pages 30-35

Optimization of Al-CVD process based on elementary reaction simulation and experimental verification: From the growth rate to the surface morphology

Author keywords

Aluminium; CVD; Dimethyl aluminum hydride; Elementary reaction simulation; Nozzle reactor; Surface adsorbate; Surface morphology

Indexed keywords

ALUMINUM; CHEMICAL REACTIONS; CRYSTAL GROWTH; MORPHOLOGY; OPTIMIZATION; OXIDATION; SURFACE ROUGHNESS;

DIMETHYL-ALUMINUM-HYDRIDE; ELEMENTARY REACTION SIMULATION; NOZZLE REACTOR; SURFACE ADSORBATE;

CHEMICAL VAPOR DEPOSITION;

EID: 30944448817 PISSN: 00406090 EISSN: None Source Type: Journal
DOI: 10.1016/j.tsf.2005.07.058 Document Type: Conference Paper

Times cited : (8)

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