-
1
-
-
51049114891
-
Narrow Bandwidth Single-Resonator MEMS Tuning Fork Filter
-
Geneva, Switzerland
-
Yan, J.; Seshia, A.A.; Phan, K.L.; Steeneken, P.G.; van Beek, J.T.M. Narrow Bandwidth Single-Resonator MEMS Tuning Fork Filter. In Proceedings of IEEE International Frequency Control Symposium joint with the 21st European Frequency and Time Forum, Geneva, Switzerland, 2007; pp. 1366-1369.
-
(2007)
Proceedings of IEEE International Frequency Control Symposium Joint With the 21st European Frequency and Time Forum
, pp. 1366-1369
-
-
Yan, J.1
Seshia, A.A.2
Phan, K.L.3
Steeneken, P.G.4
van Beek, J.T.M.5
-
2
-
-
33751176674
-
The application of polycrystalline diamond in a thin film packaging process for MEMS resonators
-
Zhu, X.; Aslam, D.M.; Sullivan, J.P. The application of polycrystalline diamond in a thin film packaging process for MEMS resonators. Diam. Relat. Mater. 2006, 15, 2068-2072.
-
(2006)
Diam. Relat. Mater
, vol.15
, pp. 2068-2072
-
-
Zhu, X.1
Aslam, D.M.2
Sullivan, J.P.3
-
3
-
-
50049111151
-
Cmos-Compatible Dual-Resonator MEMS Temperature Sensor with Milli-Degree Accuracy
-
Lyon, France
-
Jha, C.M.; Bahl, G.; Melamud, R.; Chandorkar, S. A.; Hopcroft, M. A.; Kim, B.; Agarwal, M.; Salvia, J.; Mehta, H.; Kenny, T.W. Cmos-Compatible Dual-Resonator MEMS Temperature Sensor with Milli-Degree Accuracy. In Proceedings of the Solid-State Sensors, Actuators and Microsystems Conference, Lyon, France, 2007; pp. 229-232.
-
(2007)
Proceedings of The Solid-State Sensors, Actuators and Microsystems Conference
, pp. 229-232
-
-
Jha, C.M.1
Bahl, G.2
Melamud, R.3
Chandorkar, S.A.4
Hopcroft, M.A.5
Kim, B.6
Agarwal, M.7
Salvia, J.8
Mehta, H.9
Kenny, T.W.10
-
4
-
-
33644883052
-
CVD diamond thin film technology for MEMS packaging
-
Zhu, X.; Aslam, D.M. CVD diamond thin film technology for MEMS packaging. Diam. Relat. Mater. 2006, 15, 254-258.
-
(2006)
Diam. Relat. Mater
, vol.15
, pp. 254-258
-
-
Zhu, X.1
Aslam, D.M.2
-
5
-
-
71549155924
-
Wafer-level fabrication and gas sensing properties of miniaturized gas sensors based on inductively coupled plasma deposited tin oxide nanorods
-
Forleo, A.; Francioso, L.; Capone, S.; Casino, F.; Siciliano, P.; Tan, O.K.; Hui, H. Wafer-level fabrication and gas sensing properties of miniaturized gas sensors based on inductively coupled plasma deposited tin oxide nanorods. Procedia Chem. 2009, 1, 196-199.
-
(2009)
Procedia Chem
, vol.1
, pp. 196-199
-
-
Forleo, A.1
Francioso, L.2
Capone, S.3
Casino, F.4
Siciliano, P.5
Tan, O.K.6
Hui, H.7
-
6
-
-
23844450347
-
Electrostatically actuated resonant microcantilever beam in cmos technology for the detection of chemical weapons
-
Voiculescu, I.; Zaghloul, M.E. Electrostatically actuated resonant microcantilever beam in cmos technology for the detection of chemical weapons. IEEE Sens. J. 2005, 5, 641-647.
-
(2005)
IEEE Sens. J
, vol.5
, pp. 641-647
-
-
Voiculescu, I.1
Zaghloul, M.E.2
-
7
-
-
4344692139
-
Stable thin film encapsulation of acceleration sensors using polycrystalline silicon as sacrificial and encapsulation layer
-
Höchst, A.; Scheuerer, R; Stahl, H.; Fischer, F.; Metzger, L.; Reichenbach, R.; Lärmer, F.; Kronmüller, S.; Watcham, S.; Rusu, C.; Witvrouw, A.; Gunn, R. Stable thin film encapsulation of acceleration sensors using polycrystalline silicon as sacrificial and encapsulation layer. Sensor. Actuator. A-Phys. 2004, 114, 355-361.
-
(2004)
Sensor. Actuator. A-Phys
, vol.114
, pp. 355-361
-
-
Höchst, A.1
Scheuerer, R.2
Stahl, H.3
Fischer, F.4
Metzger, L.5
Reichenbach, R.6
Lärmer, F.7
Kronmüller, S.8
Watcham, S.9
Rusu, C.10
Witvrouw, A.11
Gunn, R.12
-
9
-
-
35348847045
-
The New Heart Beat of Electronics-Silicon MEMS Oscillators
-
Reno, NV, USA
-
Hsu, W.T.; Pai, M. The New Heart Beat of Electronics-Silicon MEMS Oscillators. In Proceedings of the 57th Electronic Components and Technology Conference, Reno, NV, USA, 2007; pp. 1895-1899.
-
(2007)
Proceedings of The 57th Electronic Components and Technology Conference
, pp. 1895-1899
-
-
Hsu, W.T.1
Pai, M.2
-
10
-
-
71449099193
-
Parameter Extraction and Support-Loss in MEMS Resonators
-
Boston, MA, USA
-
Steeneken, P.G.; Ruigrok, J.J.M.; Kang, S.; van Beek, J.T.M.; Bontemps, J.; Koning, J.J.; Parameter Extraction and Support-Loss in MEMS Resonators. In Proceedings of Comsol Conference 2007, Boston, MA, USA, 2007.
-
(2007)
Proceedings of Comsol Conference
, pp. 2007
-
-
Steeneken, P.G.1
Ruigrok, J.J.M.2
Kang, S.3
van Beek, J.T.M.4
Bontemps, J.5
Koning, J.J.6
-
12
-
-
69249206588
-
MEMS reliability: Where are we now?
-
Tanner, D.M. MEMS reliability: Where are we now? Microelectron. Rel. 2009, 49, 264-270.
-
(2009)
Microelectron. Rel
, vol.49
, pp. 264-270
-
-
Tanner, D.M.1
-
13
-
-
44849090943
-
Thin film encapsulation technology for harms using sacrificial CF-polymer
-
Reuter, D.; Bertz, A.; Nowack, M.; Gessner, T. Thin film encapsulation technology for harms using sacrificial CF-polymer. Sensor. Actuator. A-Phys. 2008, 145-146, 316-322.
-
(2008)
Sensor. Actuator. A-Phys
, vol.145-146
, pp. 316-322
-
-
Reuter, D.1
Bertz, A.2
Nowack, M.3
Gessner, T.4
-
14
-
-
67349110146
-
Wafer-level thin-film encapsulation for MEMS
-
O'Mahony, C.; Hill, M.; Olszewski, Z.; Blake, A. Wafer-level thin-film encapsulation for MEMS. Microelectron. Eng. 2009, 86, 1311-1313.
-
(2009)
Microelectron. Eng
, vol.86
, pp. 1311-1313
-
-
O'Mahony, C.1
Hill, M.2
Olszewski, Z.3
Blake, A.4
-
15
-
-
71649092714
-
Development of wafer scale encapsulation process for large displacement piezoresistive MEMS devices
-
Ayanoor-Vitikkate, V.; Chen, K.; Park, W.-T.; Kenny, T.W. Development of wafer scale encapsulation process for large displacement piezoresistive MEMS devices. Sensor. Actuator. A-Phys. 2009, 156, 275-283.
-
(2009)
Sensor. Actuator. A-Phys
, vol.156
, pp. 275-283
-
-
Ayanoor-Vitikkate, V.1
Chen, K.2
Park, W.-T.3
Kenny, T.W.4
-
16
-
-
50249106306
-
Wafer level encapsulation technology for MEMS devices using on HF-permeable PECVD SIOC capping layer
-
Tucson, AZ, USA
-
Verheijden, G.J.A.M.; Koops, G.E.J.; Phan, K.L.; van Beek, J.T.M. Wafer level encapsulation technology for MEMS devices using on HF-permeable PECVD SIOC capping layer. In Proceedings of the 21st International Conference on Micro Mechanical Electrical Mechanical Systems, Tucson, AZ, USA, 2008; pp. 798-801.
-
(2008)
Proceedings of The 21st International Conference On Micro Mechanical Electrical Mechanical Systems
, pp. 798-801
-
-
Verheijden, G.J.A.M.1
Koops, G.E.J.2
Phan, K.L.3
van Beek, J.T.M.4
-
17
-
-
0037302645
-
Fracture strength characterization and failure analysis of silicon dies
-
Wu, J.D.; Huang, C.Y.; Liao, C.C.; Fracture strength characterization and failure analysis of silicon dies. Microelectron. Rel. 2003, 43, 269-277.
-
(2003)
Microelectron. Rel
, vol.43
, pp. 269-277
-
-
Wu, J.D.1
Huang, C.Y.2
Liao, C.C.3
-
18
-
-
33747755925
-
-
1st ed.; Springer: Dordrecht, The Netherlands, 2006; Volume 141, ISBN: 1-4020-4934-X
-
Zhang, G.Q.; van Driel, W.D.; Fan, X.J. In Mechanics of Microelectronics, 1st ed.; Springer: Dordrecht, The Netherlands, 2006; Volume 141, ISBN: 1-4020-4934-X.
-
Mechanics of Microelectronics
-
-
Zhang, G.Q.1
van Driel, W.D.2
Fan, X.J.3
-
19
-
-
50149118839
-
Debris-Free In-Air Laser Dicing for Multi-Layer MEMS by Perforated Internal Transformation and Thermally-Induced Crack Propagation
-
Tucson, AZ, USA
-
Izawa, Y.; Tanaka, S. Debris-Free In-Air Laser Dicing for Multi-Layer MEMS by Perforated Internal Transformation and Thermally-Induced Crack Propagation. In Proceedings of the 21st International Conference on Micro Mechanical Electrical Mechanical Systems, Tucson, AZ, USA, 2008; pp. 822-827.
-
(2008)
Proceedings of The 21st International Conference On Micro Mechanical Electrical Mechanical Systems
, pp. 822-827
-
-
Izawa, Y.1
Tanaka, S.2
-
20
-
-
77951761585
-
-
NXP Semiconductors: Nijmegen, The Netherlands
-
Internal Report Sumo; NXP Semiconductors: Nijmegen, The Netherlands, 2009.
-
(2009)
Internal Report Sumo
-
-
-
21
-
-
67650520399
-
Modeling, Simulation and Calibration of the Chip Encapsulation Molding Process
-
Delft, The Netherlands
-
Roellig, M.; Meyer, S.; Thiele, M.; Rzepka, S.; Wolter, K.-J. Modeling, Simulation and Calibration of the Chip Encapsulation Molding Process. In Proceedings of EuroSimE 2009, Delft, The Netherlands, 2009.
-
(2009)
Proceedings of EuroSimE 2009
-
-
Roellig, M.1
Meyer, S.2
Thiele, M.3
Rzepka, S.4
Wolter, K.-J.5
-
22
-
-
0000463246
-
Vertical die crack stresses of Flip Chip induced in major package assembly processes
-
Yang, D.G.; Ernst, L.J.; van 't Hof, C.; Kiasat, M. S.; Bisschop, J.; Janssen, J.; Kuper, F.; Liang, Z. N.; Schravendeel, R.; Zhang, G.Q. Vertical die crack stresses of Flip Chip induced in major package assembly processes. Microelectron. Rel. 2000, 40, 1533-1538.
-
(2000)
Microelectron. Rel
, vol.40
, pp. 1533-1538
-
-
Yang, D.G.1
Ernst, L.J.2
Kiasat, M.S.3
Bisschop, J.4
Janssen, J.5
Kuper, F.6
Liang, Z.N.7
Schravendeel, R.8
Zhang, G.Q.9
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