Relation of nanoscale and macroscopic properties of mixed-phase silicon thin films

Physica Status Solidi (A) Applications and Materials Science

Volumn 207, Issue 3, 2010, Pages 582-586

  Fejfar, A ^a   Vetushka, A ^a   Kalusova V ^a   Certik O ^a   Ledinsky M ^a   Rezek, B ^a   Stuchlik J ^a   Kocka J ^a  

^a INSTITUTE OF PHYSICS   (Czech Republic)

Author keywords

[No Author keywords available]

Indexed keywords

AFM; AMORPHOUS PHASE; CALCULATED VALUES; CONCENTRATION OF; CONDUCTIVE ATOMIC FORCE MICROSCOPY; CONDUCTIVE GRAINS; COPLANAR CONTACTS; DARK CONDUCTIVITY; EFFECTIVE MEDIUM APPROXIMATION; HIGHER ORDER; INTERNAL FIELD; LOCAL FIELDS; MACROSCOPIC PROPERTIES; MICROCRYSTALLINE GRAINS; MIXED PHASE; NANO SCALE; NANOMETER RESOLUTIONS; NANOSCALE PROPERTIES; PARTIAL CORRELATION; PERCOLATION THRESHOLDS; QUANTITATIVE DESCRIPTION; SCANNING PROBES; SI FILMS; SILICON THIN FILM;

ATOMIC FORCE MICROSCOPY; CONDUCTIVE FILMS; NANOSTRUCTURED MATERIALS; PROBES; SEMICONDUCTING SILICON COMPOUNDS; SOLVENTS; THIN FILMS;

CRYSTAL ATOMIC STRUCTURE;

EID: 77950996730     PISSN: 18626300     EISSN: 18626319     Source Type: Journal    
DOI: 10.1002/pssa.200982907     Document Type: Article

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