메뉴 건너뛰기




Volumn 57, Issue 3, 2010, Pages 551-561

Measurement and modeling of carrier transport parameters applicable to SiGe BiCMOS technology operating in extreme environments

Author keywords

Carrier mobility; Carrier transport parameters; Cryogenic operation; Heavy ion strike; Incomplete ionization; Shockley Read Hall (SRH) recombination; SiGe; Silicon germanium heterojunction bipolar transistor (SiGeHBT); Single event effects (SEE); TCAD parameter models; Total ionizing dose (TID)

Indexed keywords

BICMOS TECHNOLOGY; BISMUTH ALLOYS; CARRIER LIFETIME; CARRIER MOBILITY; CARRIER TRANSPORT; CRYOGENICS; ELECTRONIC DESIGN AUTOMATION; HALL MOBILITY; HEAVY IONS; HETEROJUNCTION BIPOLAR TRANSISTORS; HETEROJUNCTIONS; IONIZATION; IONIZING RADIATION; PARAMETER ESTIMATION; TEMPERATURE DISTRIBUTION;

EID: 77649184043     PISSN: 00189383     EISSN: None     Source Type: Journal    
DOI: 10.1109/TED.2009.2038033     Document Type: Article
Times cited : (9)

References (37)
  • 2
    • 24944489135 scopus 로고    scopus 로고
    • On the potential of SiGe HBTs for extreme environment electronics
    • Sep
    • J. D. Cressler, "On the potential of SiGe HBTs for extreme environment electronics," Proc. IEEE, vol. 93, no. 9, pp. 1559-1582, Sep. 2005.
    • (2005) Proc. IEEE , vol.93 , Issue.9 , pp. 1559-1582
    • Cressler, J.D.1
  • 3
    • 0035172651 scopus 로고    scopus 로고
    • Single event upset test results on a prescaler fabricated in IBMs 5HP silicon germanium heterojunction bipolar transistors BiCMOS technology
    • R. Reed, P. Marshall, H. Ainspan, C. Marshall, H. Kim, J. Cressler, G. Niu, and K. LaBel, "Single event upset test results on a prescaler fabricated in IBMs 5HP silicon germanium heterojunction bipolar transistors BiCMOS technology," in Proc. IEEE Radiation Effects Data Workshop, 2001, pp. 172-176.
    • (2001) Proc. IEEE Radiation Effects Data Workshop , pp. 172-176
    • Reed, R.1    Marshall, P.2    Ainspan, H.3    Marshall, C.4    Kim, H.5    Cressler, J.6    Niu, G.7    LaBel, K.8
  • 12
    • 0034451891 scopus 로고    scopus 로고
    • Simulation of SEE-induced charge collection in UHV/CVD SiGe HBTs
    • Dec
    • G. Niu, J. Cressler, M. Shoga, K. Jobe, P. Chu, and D. Harame, "Simulation of SEE-induced charge collection in UHV/CVD SiGe HBTs," IEEE Trans. Nucl. Sci., vol. 47, no. 6, pp. 2682-2689, Dec. 2000.
    • (2000) IEEE Trans. Nucl. Sci , vol.47 , Issue.6 , pp. 2682-2689
    • Niu, G.1    Cressler, J.2    Shoga, M.3    Jobe, K.4    Chu, P.5    Harame, D.6
  • 16
    • 33748621800 scopus 로고
    • Statistics of the recombinations of holes and electrons
    • Sep
    • W. Shockley and W. T. Read, "Statistics of the recombinations of holes and electrons," Phys. Rev., vol. 87, no. 5, pp. 835-842, Sep. 1952.
    • (1952) Phys. Rev , vol.87 , Issue.5 , pp. 835-842
    • Shockley, W.1    Read, W.T.2
  • 17
    • 36149004075 scopus 로고
    • Electron-hole recombination in germanium
    • Jul
    • R. N. Hall, "Electron-hole recombination in germanium," Phys. Rev., vol. 87, no. 2, p. 387, Jul. 1952.
    • (1952) Phys. Rev , vol.87 , Issue.2 , pp. 387
    • Hall, R.N.1
  • 18
    • 84946964735 scopus 로고
    • Full dynamic power diode model including temperature behavior for use in circuit simulators
    • H. Goebel and K. Hoffmann, "Full dynamic power diode model including temperature behavior for use in circuit simulators," in Proc. Int. Symp. Power Semicond. Devices ICs, 1992, pp. 130-135.
    • (1992) Proc. Int. Symp. Power Semicond. Devices ICs , pp. 130-135
    • Goebel, H.1    Hoffmann, K.2
  • 20
    • 21044458762 scopus 로고    scopus 로고
    • Electronic properties of iron-boron pairs in crystalline silicon by temperature- and injection-level-dependent lifetime measurements
    • May
    • J. E. Birkholz, K. Bothe, D. Macdonald, and J. Schmidt, "Electronic properties of iron-boron pairs in crystalline silicon by temperature- and injection-level-dependent lifetime measurements," J. Appl. Phys., vol. 97, no. 3, p. 103 708, May 2005.
    • (2005) J. Appl. Phys , vol.97 , Issue.3 , pp. 103-708
    • Birkholz, J.E.1    Bothe, K.2    Macdonald, D.3    Schmidt, J.4
  • 21
    • 29144522986 scopus 로고    scopus 로고
    • Electronic properties of interstitial iron and iron-boron pairs determined by means of advanced lifetime spectroscopy
    • May
    • S. Rein and S. W. Glunz, "Electronic properties of interstitial iron and iron-boron pairs determined by means of advanced lifetime spectroscopy," J. Appl. Phys., vol. 98, no. 10, p. 103 711, May 2005.
    • (2005) J. Appl. Phys , vol.98 , Issue.10 , pp. 103-711
    • Rein, S.1    Glunz, S.W.2
  • 22
    • 34648833001 scopus 로고    scopus 로고
    • Determining the defect parameters of the deep aluminum-related defect center in silicon
    • Sep
    • P. Rosenits, T. Roth, S. W. Glunz, and S. Belijakowa, "Determining the defect parameters of the deep aluminum-related defect center in silicon," Appl. Phys. Lett., vol. 91, no. 12, p. 122 109, Sep. 2007.
    • (2007) Appl. Phys. Lett , vol.91 , Issue.12 , pp. 122-109
    • Rosenits, P.1    Roth, T.2    Glunz, S.W.3    Belijakowa, S.4
  • 23
    • 27244458624 scopus 로고    scopus 로고
    • Impact of nickel contamination on carrier recombination in n- and p-type crystalline silicon wafers
    • Dec
    • D. Macdonald, "Impact of nickel contamination on carrier recombination in n- and p-type crystalline silicon wafers," Appl. Phys. A, Solids Surf., vol. 81, no. 8, pp. 1619-1625, Dec. 2005.
    • (2005) Appl. Phys. A, Solids Surf , vol.81 , Issue.8 , pp. 1619-1625
    • Macdonald, D.1
  • 24
    • 0037632551 scopus 로고    scopus 로고
    • Boron-related minority-carrier trapping centers in p-type silicon
    • Sep
    • D. Macdonald, M. Kerr, and A. Cuevas, "Boron-related minority-carrier trapping centers in p-type silicon," Appl. Phys. Lett., vol. 75, no. 11, pp. 1571-1573, Sep. 1999.
    • (1999) Appl. Phys. Lett , vol.75 , Issue.11 , pp. 1571-1573
    • Macdonald, D.1    Kerr, M.2    Cuevas, A.3
  • 25
    • 79955997779 scopus 로고    scopus 로고
    • Oxygen-related minority-carrier trapping centers in p-type Czochralski silicon
    • J. Schmidt, K. Bothe, and R. Hezel, "Oxygen-related minority-carrier trapping centers in p-type Czochralski silicon," Appl. Phys. Lett., vol. 80, no. 23, pp. 4395-4397, 2002.
    • (2002) Appl. Phys. Lett , vol.80 , Issue.23 , pp. 4395-4397
    • Schmidt, J.1    Bothe, K.2    Hezel, R.3
  • 26
    • 0037450271 scopus 로고    scopus 로고
    • Electronic properties of the metastable defect in boron-doped Czochralski silicon: Unambiguous determination by advanced lifetime spectroscopy
    • Feb
    • S. Rein and S. W. Glunz, "Electronic properties of the metastable defect in boron-doped Czochralski silicon: Unambiguous determination by advanced lifetime spectroscopy," Appl. Phys. Lett., vol. 82, no. 7, pp. 1054-1056, Feb. 2003.
    • (2003) Appl. Phys. Lett , vol.82 , Issue.7 , pp. 1054-1056
    • Rein, S.1    Glunz, S.W.2
  • 27
    • 0001548402 scopus 로고    scopus 로고
    • Temperature and injection dependence of the Shockley-Read-Hall lifetime in electron-irradiated n-type silicon
    • Jun
    • H. Bleichner, P. Jonsson, N. Keskitalo, and E. Nordlander, "Temperature and injection dependence of the Shockley-Read-Hall lifetime in electron-irradiated n-type silicon," J. Appl. Phys., vol. 79, no. 12, pp. 9142-9148, Jun. 1996.
    • (1996) J. Appl. Phys , vol.79 , Issue.12 , pp. 9142-9148
    • Bleichner, H.1    Jonsson, P.2    Keskitalo, N.3    Nordlander, E.4
  • 28
    • 0000891274 scopus 로고    scopus 로고
    • Temperature and injection dependence of the Shockley-Read-Hall lifetime in electron-irradiated p-type silicon
    • Apr
    • N. Keskitalo, P. Jonsson, K. Nordgren, H. Bleichner, and E. Nordlander, "Temperature and injection dependence of the Shockley-Read-Hall lifetime in electron-irradiated p-type silicon," J. Appl. Phys., vol. 83, no. 8, pp. 4206-4212, Apr. 1998.
    • (1998) J. Appl. Phys , vol.83 , Issue.8 , pp. 4206-4212
    • Keskitalo, N.1    Jonsson, P.2    Nordgren, K.3    Bleichner, H.4    Nordlander, E.5
  • 31
    • 0020846843 scopus 로고
    • Minority carrier lifetimes using compensated differential open circuit voltage decay
    • M. A. Green, "Minority carrier lifetimes using compensated differential open circuit voltage decay," Solid State Electron., vol. 26, no. 11, pp. 1117-1122, 1983.
    • (1983) Solid State Electron , vol.26 , Issue.11 , pp. 1117-1122
    • Green, M.A.1
  • 33
    • 0026899612 scopus 로고
    • A unified mobility model for device simulation - I. Model equations and concentration dependence
    • Jul
    • D. B. M. Klaassen, "A unified mobility model for device simulation - I. Model equations and concentration dependence," Solid State Electron., vol. 35, no. 7, pp. 953-959, Jul. 1992.
    • (1992) Solid State Electron , vol.35 , Issue.7 , pp. 953-959
    • Klaassen, D.B.M.1
  • 34
    • 0026899752 scopus 로고
    • A unified mobility model for device simulation - II. Temperature dependence of carrier mobility and lifetime
    • Jul
    • D. B. M. Klaassen, "A unified mobility model for device simulation - II. Temperature dependence of carrier mobility and lifetime," Solid State Electron., vol. 35, no. 7, pp. 961-967, Jul. 1992.
    • (1992) Solid State Electron , vol.35 , Issue.7 , pp. 961-967
    • Klaassen, D.B.M.1
  • 35
    • 33845764861 scopus 로고    scopus 로고
    • P. P. Altermatt, A. Schenk, and G. Heiser, A simulation model for the density of states and for incomplete ionization in crystalline silicon. I. Establishing the model in Si:P, J. Appl. Phys., 100, no. 11, pp. 113 714-1-113 714-10, Dec. 2006.
    • P. P. Altermatt, A. Schenk, and G. Heiser, "A simulation model for the density of states and for incomplete ionization in crystalline silicon. I. Establishing the model in Si:P," J. Appl. Phys., vol. 100, no. 11, pp. 113 714-1-113 714-10, Dec. 2006.
  • 36
    • 33845762895 scopus 로고    scopus 로고
    • A simulation model for the density of states and for incomplete ionization in crystalline silicon. II. Investigation of Si:As and Si:B and usage in device simulation
    • Dec
    • P. P. Altermatt, A. Schenk, and G. Heiser, "A simulation model for the density of states and for incomplete ionization in crystalline silicon. II. Investigation of Si:As and Si:B and usage in device simulation," J. Appl. Phys., vol. 100, no. 11, p. 113 715, Dec. 2006.
    • (2006) J. Appl. Phys , vol.100 , Issue.11 , pp. 113-715
    • Altermatt, P.P.1    Schenk, A.2    Heiser, G.3
  • 37
    • 77649192627 scopus 로고    scopus 로고
    • Sentaurus Device User Guide, Synopsys, Inc., Mountain View, CA, Sep. 2008. Version A-2008.09.
    • Sentaurus Device User Guide, Synopsys, Inc., Mountain View, CA, Sep. 2008. Version A-2008.09.


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.