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Volumn 50, Issue 3, 2010, Pages 351-355
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The frequency-dependent electrical characteristics of interfaces in the Sn/p-Si metal semiconductor structures
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Author keywords
[No Author keywords available]
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Indexed keywords
ELECTRICAL CHARACTERISTIC;
EXPERIMENTAL VALUES;
FREQUENCY CHARACTERISTIC;
FREQUENCY DEPENDENCE;
FREQUENCY DISPERSION;
FREQUENCY-DEPENDENT;
HIGH FREQUENCY;
INTERFACE STATE;
INTERFACE STATE DENSITY;
INTERFACES STATE;
LOW FREQUENCY;
LOWER FREQUENCIES;
METAL SEMICONDUCTORS;
METAL-SEMICONDUCTOR STRUCTURES;
QUANTITATIVE INFORMATION;
SCHOTTKY STRUCTURES;
SERIES RESISTANCES;
CAPACITANCE;
SEMICONDUCTING SILICON;
SEMICONDUCTING SILICON COMPOUNDS;
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EID: 76849087079
PISSN: 00262714
EISSN: None
Source Type: Journal
DOI: 10.1016/j.microrel.2009.10.017 Document Type: Article |
Times cited : (40)
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References (40)
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