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Volumn 204, Issue 12-13, 2010, Pages 2089-2094

Atomic-scale mechanisms for diffusion of impurities in transition-metal nitrides

Author keywords

Ab initio; Activation; Barrier; Diffusion; Nitrides; Transition metal

Indexed keywords

AB INITIO; ACTIVATION; ACTIVATION BARRIERS; ATOMIC-SCALE MECHANISMS; BARRIER; CU IMPURITY; DIFFUSION OF IMPURITIES; EXPERIMENTAL DATA; FILM TEXTURES; FIRST-PRINCIPLES CALCULATION; INTER-GRAIN; INTERSTITIALS; NITRIDE FILMS; TRANSITION METAL NITRIDES;

EID: 76349084726     PISSN: 02578972     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.surfcoat.2009.09.002     Document Type: Article
Times cited : (11)

References (40)


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.