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Volumn 204, Issue 12-13, 2010, Pages 2089-2094
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Atomic-scale mechanisms for diffusion of impurities in transition-metal nitrides
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Author keywords
Ab initio; Activation; Barrier; Diffusion; Nitrides; Transition metal
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Indexed keywords
AB INITIO;
ACTIVATION;
ACTIVATION BARRIERS;
ATOMIC-SCALE MECHANISMS;
BARRIER;
CU IMPURITY;
DIFFUSION OF IMPURITIES;
EXPERIMENTAL DATA;
FILM TEXTURES;
FIRST-PRINCIPLES CALCULATION;
INTER-GRAIN;
INTERSTITIALS;
NITRIDE FILMS;
TRANSITION METAL NITRIDES;
COPPER;
DENSITY FUNCTIONAL THEORY;
DIFFUSION BARRIERS;
IMPURITIES;
POINT DEFECTS;
TITANIUM NITRIDE;
ACTIVATION ENERGY;
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EID: 76349084726
PISSN: 02578972
EISSN: None
Source Type: Journal
DOI: 10.1016/j.surfcoat.2009.09.002 Document Type: Article |
Times cited : (11)
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References (40)
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