Deposition of Cu thin films from supercritical carbon dioxide using hexafluoroacetylacetnatecopper

Thin Solid Films

Volumn 491, Issue 1-2, 2005, Pages 228-234

  Kondoh, E ^a   Shigama, K ^a,b  

^a UNIVERSITY OF YAMANASHI   (Japan)

^b Star Micronics Co Ltd

Author keywords

Carbon dioxide; Copper; Scanning electronic microscopy; Supercritical fluids

Indexed keywords

CARBON DIOXIDE; CHEMICAL VAPOR DEPOSITION; COPPER; METALLIZING; SCANNING ELECTRON MICROSCOPY; SUBSTRATES; SUPERCRITICAL FLUIDS;

DEPOSITION RATE; DEPOSITION TECHNIQUES; FILM TEXTURING; TRACE LEVELS;

THIN FILMS;

EID: 25144514969     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.tsf.2005.06.005     Document Type: Article

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