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Chemical Vapor Deposition

Volumn 7, Issue 3, 2001, Pages 99-101

Organometallic ruthenium source reagents for CVD

(7) Lee, Feng Jen a Chi, Yun a Liu, Chao Shiuan a Hsu, Peng Fu a Chou, Tsung Yi a Peng, Shie Ming b Lee, Gene Hsiang b

a NATIONAL TSING HUA UNIVERSITY (Taiwan)

b NATIONAL TAIWAN UNIVERSITY (Taiwan)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0002598478 PISSN: 09481907 EISSN: None Source Type: Journal
DOI: 10.1002/1521-3862(200105)7:3<99::AID-CVDE99>3.0.CO;2-H Document Type: Article

Times cited : (33)

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