Metallorganic chemical vapor deposition of Ru and RuO2 using ruthenocene precursor and oxygen gas

Journal of the Electrochemical Society

Volumn 147, Issue 1, 2000, Pages 203-209

  Park, Sung Eon ^a   Kim, Hyun Mi ^a   Kim, Ki Bum ^a   Min, Seok Hong ^b  

^a Seoul National University   (South Korea)

^b Gangneung Wonju National University   (South Korea)

Author keywords

[No Author keywords available]

Indexed keywords

DECOMPOSITION; METALLORGANIC CHEMICAL VAPOR DEPOSITION; OXIDATION; OXYGEN; PARTIAL PRESSURE; RUTHENIUM; RUTHENIUM COMPOUNDS; THIN FILMS;

RUTHENOCENE;

ELECTROCHEMISTRY;

EID: 0033891549     PISSN: 00134651     EISSN: None     Source Type: Journal    
DOI: 10.1149/1.1393175     Document Type: Article

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