Ruthenium films prepared by liquid source chemical vapor deposition using bis-(ethylcyclopentadienyl)ruthenium

Japanese Journal of Applied Physics, Part 2: Letters

Volumn 38, Issue 10 A, 1999, Pages

  Aoyama, Tomonori ^a   Eguchi, Kazuhiro ^a  

^a TOSHIBA CORPORATION   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

CAPACITORS; CHEMICAL VAPOR DEPOSITION; CRYSTAL IMPURITIES; CRYSTAL STRUCTURE; ELECTRIC CONDUCTIVITY OF SOLIDS; ELECTRODES; POLYCRYSTALLINE MATERIALS; RUTHENIUM COMPOUNDS;

ETHYLCYCLOPENTADIENYL RUTHENIUM; LIQUID SOURCE CHEMICAL VAPOR DEPOSITION;

DIELECTRIC FILMS;

EID: 0033347996     PISSN: 00214922     EISSN: None     Source Type: Journal    
DOI: 10.1143/jjap.38.l1134     Document Type: Article

References (13)