Preparation of high quality RuO2 electrodes for high dielectric thin films by low pressure metal organic chemical vapor deposition

Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films

Volumn 16, Issue 5, 1998, Pages 2768-2771

  Lee, Jong Myeong ^a   Shin, Ju Cheol ^a   Hwang, Cheol Seong ^a   Kim, Hyeong Joon ^a   Suk, Chang Gil ^b  

^a Seoul National University   (South Korea)

^b APEX Co Ltd   (South Korea)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0001205126     PISSN: 07342101     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.581419     Document Type: Article

References (10)

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