Stamp design effect on 100 nm feature size for 8 inch NanoImprint lithography

Nanotechnology

Volumn 17, Issue 10, 2006, Pages 2701-2709

  Landis, S ^a   Chaix, N ^a   Gourgon, C ^a   Perret, C ^a   Leveder, T ^a  

^a CEA LETI   (France)

Author keywords

[No Author keywords available]

Indexed keywords

DEFORMATION; NANOTECHNOLOGY; POLYMERS; PRODUCT DESIGN; SPIN COATING; STAMPING; THICKNESS MEASUREMENT;

MOULD DEFORMATION; NANOIMPRINT LITHOGRAPHY; POLYMER FLOW PROPERTIES; PROXIMITY PRINTING EFFECTS (PPE);

ELECTRON BEAM LITHOGRAPHY;

EID: 33646754702     PISSN: 09574484     EISSN: 13616528     Source Type: Journal    
DOI: 10.1088/0957-4484/17/10/043     Document Type: Article

References (36)

1. Kim J, Fan M, Wang L, Tsuei T and Tang Z 2004 Proc. SPIE-Int. Soc. Opt. Eng. 5567 1168
2. Terasawa T 2000 Proc. SPIE-Int. Soc. Opt. Eng. 4181 8
3. Kotera M and Niu H 2004 Japan. J. Appl. Phys. 1 43 3749
4. Anderson E H, Olynick D L, Chao W, Harteneck B and Veklerov E 2001 J. Vac. Sci. Technol. B 19 2504
5. Chou S Y and Krauss P R 1997 Microelectron. Eng. 35 237-40
6. Chou S Y, Krauss P R, Zhang W, Guo L and Zhang L 1998 J. Vac. Sci. Technol. B 16 2897
7. Khang D-Y and Lee H H 1999 Appl. Phys. Lett. 75 2599
8. Perret C, Gourgon C, Lazzarino F, Tallal J, Landis S and Pelzer R 2004 Microelectron. Eng. 73/74 172-4
9. Chou S Y 1997 Proc. IEEE 85 652
10. Seekamp J et al 2002 Nanotechnology 13 581
11. Krauss P R and Chou S Y 1997 Appl. Phys. Lett. 71 3174
12. Becker H and Gartner C 2001 Rev. Mol. Biotech. 82 89
13. Guo L, Krauss P R and Chou S Y 1997 Appl. Phys. Lett. 71 1881
14. Montelius L, Heidari B, Graczyk M, Ling T, Maximov I and Sarwe E L 2000 Proc. SPIE 3997 442-52
15. Gourgon C, Perret C, Micouin G, Lazzarino F, Tortai J H and Joubert O 2003 J. Vac. Sci. Technol. B 21 98-105
16. Landis S, Pauliac S, Saint-Pol J, Gourgon C, Akita M, Hanawa R and Suetsugu M 2004 Japan. J. Appl. Phys. B 436 3974
17. Kiessig H 1931 Ann. Phys., Lpz. 10 715
18. Parratt L G 1954 Phys. Rev. 95 359
19. Young T 1805 Phil. Trans. R. Soc. A 95 65
20. Fuard D, Perret C, Farys V, Gourgon C and Schiavone P 2005 J. Vac. Sci. Technol. B 23 3069
21. Heyderman L J, Schift H, David C, Gobrecht J and Schweizer T 2000 Microelectron. Eng. 54 229-45
22. Rowland H D, Sum A C, Schunk P R and King W P 2005 J. Micromech. Microeng. 15 2414-25
23. Chaix N, Landis S, Gourgon C, Perret C, Leveder T and Delaye V 2006 50th Int. Conf. on Electron, Ion and Photon Beam Technology and Nanofabrication at press
24. Oron A, Davis S H and Bankoff S G 1997 Rev. Mod. Phys. 69 931
25. Masson J L and Green P F 2002 Phys. Rev. E 65 031806
26. Chaix N, Gourgon C, Landis S, Perret C, Reuther F and Mecerreyes D 2006 Nanotechnology submitted
27. Schulz H, Wissen M, Bogdanski N, Scheer H-C, Mattes K and Friedrich Ch 2005 Microelectron. Eng. 78/79 625-32
28. Schwartz L 1986 Phys. Fluids 29 (9) 3086-8
29. de Gennes P G 1985 Rev. Mod. Phys. (57) 827
30. Huppert H 1982 Nature 300 427
31. Schwartz L 1986 Phys. Fluids 9 29
32. Weidner D E and Schwartz L W 1994 Phys. Fluids 6 3535
33. Bertozzi A L and Brenner M P 1997 Phys. Fluids 9 530 and references within
34. Lee H-J, Ro H W, Soles C L, Jones R L, Lin E K, Wu W and Hines D R 2005 J. Vac. Sci. Technol. B 23 3023
35. Rowland H D, King W P, Sun A C and Schunk P R 2005 J. Vac. Sci. Technol. B 23 2958
36. Bogdanski N, Wissen M and Scheer H-C 2005 Proc. SPIE-Int. Soc. Opt. Eng. 5835 282