Submicron three-dimensional structures fabricated by reverse contact UV nanoimprint lithography

Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures

Volumn 24, Issue 6, 2006, Pages 3002-3005

  Kehagias, N ^a   Reboud, Vincent ^a   Chansin, G ^a   Zelsmann, M ^b   Jeppesen, C ^c   Reuther, F ^d   Schuster, C ^d   Kubenz, M ^d   Gruetzner, G ^d   Sotomayor Torres, C M ^a  

^a UNIVERSITY COLLEGE CORK   (Ireland)

^b CNRS   (France)

^c TECHNICAL UNIVERSITY OF DENMARK   (Denmark)

^d MICRO RESIST TECHNOLOGY GMBH   (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

ACETONE; MULTILAYERS; NANOTECHNOLOGY; PLASTIC FILMS; QUARTZ; ULTRAVIOLET RADIATION;

CONTACT ULTRAVIOLET LITHOGRAPHY; CROSS-LINKABLE POLYMERS; NANOIMPRINT LITHOGRAPHY;

NANOSTRUCTURED MATERIALS;

EID: 33845251156     PISSN: 10711023     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.2388962     Document Type: Article

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