Comprehensive defect analysis methodology for nano imprint lithography

Microelectronic Engineering

Volumn 84, Issue 5-8, 2007, Pages 989-993

  DiBiase, T ^a   Ahamdian, M ^a   Malik, I ^a  

^a KLA TENCOR CORPORATION   (United States)

Author keywords

Defects; Lithography; Molecular imprints; Nano imprint; NIL; Template

Indexed keywords

NANOIMPRINT LITHOGRAPHY; SUBSTRATES; SURFACE CHEMISTRY;

DEFECT MECHANISMS; MOLECULAR IMPRINTS; SEMICONDUCTOR INDUSTRY;

CRYSTAL DEFECTS;

CHEMISTRY; DEFECTS; LITHOGRAPHY; SUBSTRATES; SURFACE PROPERTIES;

EID: 34247601596     PISSN: 01679317     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.mee.2007.01.080     Document Type: Article

References (5)

1. DiBiase T., Maltabes J., Reese B., and Ahmadian M. SPIE 6151 (2006)
2. I. Peterson, G. Thompson, T. DiBiase, S. Ashkenaz, R. Pinto, Yield Management Solutions, KLA-Tencor Spring, 2000.
3. J. Huang, L. Peng, C.W. Chu, K. Bhattacharyya, B. Eynon, F. Mirzaagha, T. DiBiase, K. Son, J. Cheng, Yield Management Solutions, KLA-Tencor Spring, 2006.
4. Kocsis M., DeBisschop P., Maenhoudt M., Kim Y.C., Wells G., Light S., and DiBiase T. SPIE 5754 (2004)
5. Liang C.S., Zhou H., Boehm M., Jackson R., Wang C.Y., and Slessor M. SPIE 4344 (2001)