Development of a novel, low-viscosity UV-curable polymer system for UV-nanoimprint lithography

Microelectronic Engineering

Volumn 84, Issue 5-8, 2007, Pages 984-988

  Vogler, Marko ^a   Wiedenberg, Sabine ^a   Mühlberger, Michael ^b   Bergmair, Iris ^b   Glinsner, Thomas ^c   Schmidt, Holger ^d   Kley, Ernst Bernhard ^d   Grützner, Gabi ^a  

^a MICRO RESIST TECHNOLOGY GMBH   (Germany)

^b PROFACTOR GMBH   (Austria)

^c EV GROUP   (Austria)

^d FRIEDRICH SCHILLER UNIVERSITY JENA   (Germany)

Author keywords

Resist; Spin coating; UV curing; UV nanoimprint lithography

Indexed keywords

ORGANIC POLYMERS; SPIN COATING; ULTRAVIOLET RADIATION; VISCOSITY;

UV CURING; UV-NANOIMPRINT LITHOGRAPHY; VISCOSITY RESISTS;

NANOIMPRINT LITHOGRAPHY;

LITHOGRAPHY; POLYMERS; PRINTING; ULTRAVIOLET RADIATION;

EID: 34247868037     PISSN: 01679317     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.mee.2007.01.184     Document Type: Article

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