Projection maskless patterning for nanotechnology applications

Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures

Volumn 26, Issue 6, 2008, Pages 2059-2063

  Platzgummer, Elmar ^a   Loeschner, Hans ^a   Gross, Gerhard ^a  

^a IMS NANOFABRICATION AG   (Austria)

Author keywords

[No Author keywords available]

Indexed keywords

CHARGE COUPLED DEVICES; CHEMICAL SENSORS; ELECTRON BEAM LITHOGRAPHY; HELIUM; LOGIC CIRCUITS; METAL DRAWING; METALLIC COMPOUNDS; MOS DEVICES; NANOTECHNOLOGY; PLATE METAL; PRECISION ENGINEERING; SEMICONDUCTING GALLIUM COMPOUNDS; SEMICONDUCTOR MATERIALS; VACUUM DEPOSITION; XENON;

APERTURE PLATES; COMPLEMENTARY METAL OXIDE SEMICONDUCTORS; ENGINEERING TOOLS; EUROPEANS; EXPOSURE DOSES; HSQ RESISTS; IN-SITU; MASKLESS PATTERNING; MULTI BEAMS; NANOPATTERNING; NANOTECHNOLOGY APPLICATIONS; PRECURSOR GASSES; PROGRAMMABLE APERTURE PLATES; PROJECTION OPTICS;

TELEPHONE SYSTEMS;

EID: 57249086388     PISSN: 10711023     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.2993260     Document Type: Article

References (10)

1. CHARPAN is an integrated project of the 6th European Framework Programme (FP6) (www.charpan.com).
2. Elmar Platzgummer, Hans Loeschner, and Gerhard Gross, Proc. SPIE 6730, 673033-1 (2007).
3. C. Klein, Proc. SPIE 6921, 6921 (2008).
4. Eli Kolodney, " Progress and prospects of focused C60 ion beams.," invited talk at MNE'06, Barcelona, Spain, 17-20 September, 2006 (unpublished).
5. M. J. van Bruggen, B. Van Someren, and P. Kruit, J. Vac. Sci. Technol. B 23, 2833 (2005).
6. E. Platzgummer, Microelectron. Eng. 83, 936 (2006).
7. Christoph Ebm, Gerhard Hobler, John Melngailis, and Elmar Platzgummer (unpublished).
8. Falco C. M. J. M. van Delft, Christoph Ebm, Emile P. Naburgh, Elmar Platzgummer, Hans Loeschner, and Gerhard Gross, Microelectron. Eng. 85, 937 (2008).
9. Gang Chen (unpublished).
10. The LAYOUT BEAMER software was provided by GenlSys (www.genisys-gmbh.de).