Chemical vapor deposited RuOx films: Annealing effects

Thin Solid Films

Volumn 425, Issue 1-2, 2003, Pages 163-170

  Gopal Ganesan, P ^a   Shpilman, Z ^a   Eizenberg, M ^a  

^a TECHNION ISRAEL INSTITUTE OF TECHNOLOGY   (Israel)

Author keywords

Annealing; Organometallic vapor deposition; Ruthenium; Ruthenium oxide

Indexed keywords

CHEMICAL VAPOR DEPOSITION; CRYSTALLIZATION; DENSIFICATION; RAPID THERMAL ANNEALING; REDOX REACTIONS; RUTHENIUM COMPOUNDS; SPUTTERING; STRESS ANALYSIS; THERMAL EFFECTS;

OXYGEN FLOW RATE;

THIN FILMS;

EID: 0037415766     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0040-6090(02)01108-2     Document Type: Article

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