Coexistence of several structural phases in MOCVD TiO2 layers: Evolution from nanometre to micrometre thick films

Journal of Physics D: Applied Physics

Volumn 42, Issue 17, 2009, Pages

  Brevet, A ^a,b   Marco De Lucas, M C ^a   Potin, V ^a   Chassagnon, R ^a   Imhoff, L ^a   Domenichini, B ^a   Bourgeois, S ^a  

^a UNIVERSITÉ DE BOURGOGNE   (France)

^b CEA GRENOBLE   (France)

Author keywords

[No Author keywords available]

Indexed keywords

AMORPHOUS PHASE; AMORPHOUS TIO; CHEMICAL VAPOUR DEPOSITION; COLUMNAR STRUCTURES; CRYSTALLIZED GRAINS; GRAZING INCIDENCE X-RAY DIFFRACTION; METAL ORGANIC; MOCVD; NANOMETRES; PHASE DISTRIBUTION; RUTILE PHASIS; SI(1 0 0); STRUCTURAL PHASIS; TIO;

CHEMICAL VAPOR DEPOSITION; HIGH RESOLUTION TRANSMISSION ELECTRON MICROSCOPY; ORGANIC CHEMICALS; ORGANOMETALLICS; OXIDE MINERALS; THICK FILMS; TITANIUM DIOXIDE; TITANIUM OXIDES;

FILM GROWTH;

EID: 70249102799     PISSN: 00223727     EISSN: 13616463     Source Type: Journal    
DOI: 10.1088/0022-3727/42/17/175302     Document Type: Article

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