Angle resolved X-ray photoemission spectroscopy double layer model for in situ characterization of metal organic chemical vapour deposition nanometric films

Thin Solid Films

Volumn 515, Issue 16 SPEC. ISS., 2007, Pages 6407-6410

  Brevet, A ^a   Imhoff, L ^a   Marco de Lucas, M C ^a   Domenichini, B ^a   Bourgeois, S ^a  

^a LABORATOIRE INTERDISCIPLINAIRE CARNOT DE BOURGOGNE   (France)

Author keywords

ARXPS; Interface; MOCVD; Thickness measurement; Thin film; TiO2

Indexed keywords

FILM GROWTH; FILM THICKNESS; METALLORGANIC CHEMICAL VAPOR DEPOSITION; SURFACE CHEMISTRY; THICKNESS MEASUREMENT; X RAY PHOTOELECTRON SPECTROSCOPY;

INTERFACIAL LAYERS; SILICON OXIDE; SURFACE COVERAGE DETERMINATION;

THIN FILMS;

EID: 34247465513     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.tsf.2006.11.076     Document Type: Article

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