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Volumn 322, Issue 1-2, 1998, Pages 63-67
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SEM and XPS studies of titanium dioxide thin films grown by MOCVD
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Author keywords
Insulator; MOCVD; Oxides; Tio2; Titanium oxide
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Indexed keywords
ALUMINA;
FILM GROWTH;
FILM PREPARATION;
METALLORGANIC CHEMICAL VAPOR DEPOSITION;
MORPHOLOGY;
SCANNING ELECTRON MICROSCOPY;
SILICON;
SPUTTER DEPOSITION;
SURFACE PROPERTIES;
THIN FILMS;
TITANIUM DIOXIDE;
X RAY PHOTOELECTRON SPECTROSCOPY;
METAL ORGANIC PRECURSORS;
DIELECTRIC FILMS;
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EID: 0032496477
PISSN: 00406090
EISSN: None
Source Type: Journal
DOI: 10.1016/S0040-6090(97)00958-9 Document Type: Article |
Times cited : (176)
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References (16)
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