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Volumn 322, Issue 1-2, 1998, Pages 63-67

SEM and XPS studies of titanium dioxide thin films grown by MOCVD

Author keywords

Insulator; MOCVD; Oxides; Tio2; Titanium oxide

Indexed keywords

ALUMINA; FILM GROWTH; FILM PREPARATION; METALLORGANIC CHEMICAL VAPOR DEPOSITION; MORPHOLOGY; SCANNING ELECTRON MICROSCOPY; SILICON; SPUTTER DEPOSITION; SURFACE PROPERTIES; THIN FILMS; TITANIUM DIOXIDE; X RAY PHOTOELECTRON SPECTROSCOPY;

EID: 0032496477     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0040-6090(97)00958-9     Document Type: Article
Times cited : (176)

References (16)
  • 8
    • 0347056604 scopus 로고    scopus 로고
    • Thesis, Université de Bourgogne
    • P. Babelon, Thesis, Université de Bourgogne, 1997.
    • (1997)
    • Babelon, P.1
  • 13
    • 0002639556 scopus 로고
    • Sputtering by particle bombardment II
    • R. Behrisch (Ed.), Springer-Verlag, Berlin
    • G. Betz, G.K. Wehner, Sputtering by particle bombardment II, in: R. Behrisch (Ed.), Topics in Applied Physics, Vol. 52, Springer-Verlag, Berlin, 1983, p. 11.
    • (1983) Topics in Applied Physics , vol.52 , pp. 11
    • Betz, G.1    Wehner, G.K.2


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.