Macroscale computer simulations to investigate the chemical vapor deposition of thin metal-oxide films

Surface and Coatings Technology

Volumn 201, Issue 22-23 SPEC. ISS., 2007, Pages 8838-8841

  Neyts, E ^a   Bogaerts, A ^a   De Meyer, M ^b,c   Van Gils, S ^b,c  

^a UNIVERSITY OF ANTWERP   (Belgium)

^b Onderzoekscentrum voor de Aanwending van Staal   (Belgium)

^c FLAMAC (Flanders Materials Centre)   (Belgium)

Author keywords

[No Author keywords available]

Indexed keywords

CHEMICAL VAPOR DEPOSITION; COMPUTER SIMULATION; DEPOSITION RATES; REACTION RATES; THIN FILMS;

MASS LIMITED REGIME; THIN METAL-OXIDE FILMS;

TITANIUM DIOXIDE;

CHEMICAL VAPOR DEPOSITION; COMPUTER SIMULATION; DEPOSITION RATES; REACTION RATES; THIN FILMS; TITANIUM DIOXIDE;

EID: 34547756352     PISSN: 02578972     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.surfcoat.2007.04.102     Document Type: Article

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