Effect of microstructure and crystallinity on the photocatalytic activity of TiO2 thin films deposited by dc magnetron sputtering

Journal of Physics D: Applied Physics

Volumn 40, Issue 17, 2007, Pages 5232-5238

  Eufinger, K ^a   Poelman, D ^a   Poelman, H ^a   De Gryse, R ^a   Marin, G B ^a  

^a GHENT UNIVERSITY   (Belgium)

Author keywords

[No Author keywords available]

Indexed keywords

AMORPHOUS MATERIALS; ANNEALING; ARGON; CRYSTALLIZATION; MAGNETRON SPUTTERING; MICROSTRUCTURE; PHOTOCATALYSIS; REFRACTIVE INDEX; SCANNING ELECTRON MICROSCOPY; STOICHIOMETRY; TITANIUM DIOXIDE; ULTRAVIOLET VISIBLE SPECTROSCOPY; X RAY DIFFRACTION;

AR-PRESSURE; PHOTOCATALYTIC TEST REACTOR; SUB-STOICHIOMETRIC; THIN FILM DENSITY;

THIN FILMS;

EID: 34548668399     PISSN: 00223727     EISSN: 13616463     Source Type: Journal    
DOI: 10.1088/0022-3727/40/17/033     Document Type: Article

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