Initial stages of TiO2 thin films MOCVD growth studied by in situ surface analyses

Journal of Crystal Growth

Volumn 275, Issue 1-2, 2005, Pages

  Brevet, A ^a   Peterle P M ^a   Imhoff, L ^a   Marco De Lucas, M C ^a   Bourgeois, S ^a  

^a UNIVERSITÉ DE BOURGOGNE   (France)

Author keywords

A1. Electron spectroscopy for chemical analysis; A3. Metalorganic chemical vapor deposition; B1. Titanium dioxide

Indexed keywords

CRYSTAL GROWTH; ELECTRON SPECTROSCOPY; METALLORGANIC CHEMICAL VAPOR DEPOSITION; PRESSURE EFFECTS; SILICON; SURFACE PROPERTIES; TITANIUM DIOXIDE; WETTING; X RAY PHOTOELECTRON SPECTROSCOPY;

ELECTRON SPECTROSCOPY OF CHEMICAL ANALYSIS; GROWTH MECHANISMS; MIXED OXIDES; SURFACE ANALYSIS;

THIN FILMS;

EID: 15844391620     PISSN: 00220248     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.jcrysgro.2004.11.081     Document Type: Conference Paper

References (18)

1. B.S. Richards, S.F. Rowlands, A. Ueranatasun, J.E. Cotter, and C.B. Honsberg Solar Energy 76 2004 269
2. J.-P. Lu, and R. Raj J. Mater. Res. 6 1991 1913
3. A. Sandell, M.P. Anderson, Y. Alfredsson, M.K.-J. Johansson, J. Schnadt, H. Rensmo, H. Siegbahn, and P. Uvdal J. Appl. Phys. 92 2002 3381
4. F. Fabreguette, L. Imhoff, O. Heintz, M. Maglione, B. Domenichini, M.C. Marco de Lucas, P. Sibillot, S. Bourgeois, and M. Sacilotti Appl. Surf. Sci. 175-176 2001 685
5. A. Rothschild, F. Edelman, Y. Komem, and F. Cosandey Sens. Actuators B 67 2000 282
6. E. Puzenat, and P. Pichat J. Photochem. Photobiol. A 160 2003 127
7. C.S. Fadley Prog. Surf. Sci. 16 1984 275
8. C.D. Wagner, W.M. Riggs, L.E. Davis, J.F. Moulder, G.E. Muilenberg, Handbook of X-ray Photoelectron Spectroscopy, Perkin-Elmer Corporation, Physical Electronics Division, 1979.
9. J.J. Yeh, and I. Lindau At. Data Nucl. Data Tables 32 1985 pp.1-155
10. F. Rochet, Ch. Poncey, G. Dufour, H. Roulet, C. Guillot, and F. Sirotti J. Non-Cryst. Solids 216 1997 148
11. S. Pétigny, H. Mostéfa-Sba, B. Domenichini, E. Lesniewska, A. Steinbrunn, and S. Bourgeois Surf. Sci. 410 1998 250
12. R. Larciprete, and E. Borsella J. Electron. Spectrosc. Relat. Phenom. 76 1995 607
13. D.M. Dobkin, M.K. Zuraw, Principles of Chemical Vapor Deposition, Kluwer Academic Publishers, 2003.
14. W. Tsai Microelectron. Eng. 65 2003 259
15. A.Y. Stakheev, E.S. Shpiro, and J. Apijok J. Phys. Chem. 97 1993 5668
16. X. Gao, and I.E. Wachs Catal. Today 51 1999 233
17. P. Babelon, A.S. Dequiedt, H. Mostéfa-Sba, S. Bourgeois, P. Sibillot, and M. Sacilotti Thin Solid Films 322 1998 63
18. D. Briggs, J.T. Grant, Surface Analysis by Auger and X-ray Photoelectron spectroscopy, Surface Spectra, IMP Publications, 2003.