Porosity and microstructure of plasma deposited TiO2 thin films

Microporous and Mesoporous Materials

Volumn 118, Issue 1-3, 2009, Pages 314-324

  Borrás, Ana ^a,b   Sánchez Valencia, Juan R ^a   Garrido Molinero, Jesús ^a   Barranco, Angel ^a   González Elipe, Agustín R ^a  

^a INSTITUTO DE CIENCIA DE MATERIALES DE SEVILLA   (Spain)

^b SWISS FEDERAL LABORATORIES FOR MATERIALS SCIENCE AND TECHNOLOGY   (Switzerland)

Author keywords

Microstructure; Porosity; Thin film; Titanium dioxide; Water isotherm

Indexed keywords

ADSORPTION; ADSORPTION ISOTHERMS; ATMOSPHERIC TEMPERATURE; CRYSTAL MICROSTRUCTURE; CRYSTALLINE MATERIALS; DESORPTION; DYES; GAS ADSORPTION; ISOTHERMS; MICROSTRUCTURE; OXIDE MINERALS; OXIDES; PLASMA DEPOSITION; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION; PLASMAS; PORE SIZE; POROSITY; QUARTZ; QUARTZ CRYSTAL MICROBALANCES; REFRACTION; SCANNING ELECTRON MICROSCOPY; SOLIDS; THIN FILM DEVICES; THIN FILMS; TITANIUM; TITANIUM DIOXIDE; TOLUENE; WATER ANALYSIS; WATER VAPOR;

CHEMICAL VAPOUR DEPOSITIONS; COLUMNAR FILMS; CRYSTALLINE FILMS; DESORPTION ISOTHERMS; DIFFERENT MICROSTRUCTURES; EXPERIMENTAL PARAMETERS; GAS COMPOSITIONS; HOMOGENEOUS FILMS; IN VACUUMS; LOW PRESSURES; MICRO PORES; NO ADSORPTIONS; PLASMA CONDITIONS; PORE SIZE DISTRIBUTIONS; QUARTZ CRYSTAL MONITORS; REFRACTION INDICES; SCANNING ELECTRON MICROGRAPHS; TITANIUM TETRAISOPROPOXIDE; WATER ADSORPTIONS;

DEWATERING;

EID: 57649240490     PISSN: 13871811     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.micromeso.2008.09.002     Document Type: Article

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