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Journal of Applied Physics

Volumn 106, Issue 4, 2009, Pages

Scratching properties of nickel-iron thin film and silicon using atomic force microscopy

(5) Tseng, Ampere A a Shirakashi, Jun Ichi b Nishimura, Shinya b Miyashita, Kazuya b Notargiacomo, Andrea c,d

a Arizona State University (United States)

b TOKYO UNIVERSITY OF AGRICULTURE AND TECHNOLOGY (Japan)

c ROMA TRE UNIVERSITY (Italy)

d CNR (Italy)

Author keywords

[No Author keywords available]

Indexed keywords

AFM TIP; FERROMAGNETIC DEVICES; IRON THIN FILMS; MATERIAL PROPERTY; NANO SCALE; NANOCONSTRICTIONS; NANOPATTERNING; NIFE THIN FILMS; NORMAL FORCES; PATTERNING TECHNIQUES; PERMALLOY THIN FILMS; PRIMARY FACTORS; SCRATCH SPEED; SCRATCHING TECHNIQUES; TIP FORCES;

ATOMIC FORCE MICROSCOPY; ATOMS; THIN FILM DEVICES; THIN FILMS;

SEMICONDUCTING SILICON COMPOUNDS;

EID: 69749127469 PISSN: 00218979 EISSN: None Source Type: Journal
DOI: 10.1063/1.3197313 Document Type: Article

Times cited : (47)

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