Magnetoresistive effects in planar NiFe nanoconstrictions

Journal of Applied Physics

Volumn 95, Issue 11 II, 2004, Pages 6720-6722

  Florez, S H ^a   Dreyer, M ^a   Schwab, K ^a   Sanchez, C ^a   Gomez, R D ^a  

^a NONE

Author keywords

[No Author keywords available]

Indexed keywords

ELECTRIC RESISTANCE; ELECTRON BEAM LITHOGRAPHY; EVAPORATION; MAGNETIC DOMAINS; MAGNETIC FIELD EFFECTS; MAGNETIZATION; MAGNETORESISTANCE; NICKEL COMPOUNDS; NUCLEATION; SCANNING ELECTRON MICROSCOPY;

MAGNETIC FORCE MICROSCOPY (MFM); NANOCONSTRICTIONS; NANOWIRES;

NANOSTRUCTURED MATERIALS;

EID: 2942644729     PISSN: 00218979     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.1682831     Document Type: Conference Paper

References (11)

1. G. G. Cabrera and L. M. Falicov, Phys. Status Solidi B 62, 217 (1974).
2. P. M. Levy and S. Zhang, Phys. Rev. Lett. 79, 5110 (1997).
3. R. P. van Gorkom, A. Brataas, and G. E. W. Bauer, Phys. Rev. Lett. 83, 4401 (1999).
4. G. Tatara and H. Fukuyama, J. Magn. Magn. Mater. 177-181, 193 (1998).
5. A. D. Kent et al., IEEE Trans. Magn. 34, 900 (1998).
6. Y. B. Xu et al., Phys. Rev. B 46, R014901 (2000).
7. C. Yu et al., J. Appl. Phys. 93, 8761 (2003).
8. S. J. C. H. Theeuwen et al., J. Appl. Phys. 89, 4442 (2000).
9. Y. Otani et al., IEEE Trans. Magn. 34, 1096 (1998).
10. P. Bruno, Phys. Rev. Lett. 83, 2425 (1999).
11. U. Ebels et al., Phys. Rev. Lett. 84, 983 (2000).