Machining characterization of the nano-lithography process using atomic force microscopy

Nanotechnology

Volumn 11, Issue 3, 2000, Pages 181-187

  Fang, Te Hua ^a   Weng, Cheng I ^a   Chang, Jee Gong ^a  

^a NATIONAL CHENG KUNG UNIVERSITY   (Taiwan)

Author keywords

[No Author keywords available]

Indexed keywords

ATOMIC FORCE MICROSCOPY; CANTILEVER BEAMS; DYNAMIC LOADS; MACHINING; SURFACE ROUGHNESS;

SCRIBING CYCLES;

NANOTECHNOLOGY;

EID: 0034274051     PISSN: 09574484     EISSN: None     Source Type: Journal    
DOI: 10.1088/0957-4484/11/3/308     Document Type: Article

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