Submicrometer lithography of a silicon substrate by machining of photoresist using atomic force microscopy followed by wet chemical etching

Nanotechnology

Volumn 8, Issue 2, 1997, Pages 76-81

  Li, S F Y ^a   Ng, H T ^a   Zhang, P C ^a   Ho, P K H ^a   Zhou, L ^a   Bao, G W ^a   Chan, S L H ^b  

^a NATIONAL UNIVERSITY OF SINGAPORE   (Singapore)

^b CHARTERED SEMICONDUCTOR MANUFACTURING LTD   (Singapore)

Author keywords

[No Author keywords available]

Indexed keywords

ATOMIC FORCE MICROSCOPY; ETCHING; LITHOGRAPHY; MACHINING; MASKS; SILICON WAFERS; SUBSTRATES;

SUBMICROMETER LITHOGRAPHY; WET CHEMICAL ETCHING;

PHOTORESISTS;

EID: 0031164123     PISSN: 09574484     EISSN: None     Source Type: Journal    
DOI: 10.1088/0957-4484/8/2/005     Document Type: Article

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