Effects of an added iodine source (C2H5I) on Ru metal-organic CVD

Chemical Vapor Deposition

Volumn 9, Issue 2, 2003, Pages 105-109

  Kim, Jae Jeong ^a   Kim, Moon Soo ^a   Yoon, Do Young ^b  

^a Seoul National University   (South Korea)

^b Kwangwoon University   (South Korea)

Author keywords

Deposition rate; Iodine; Ruthenium; Surface roughness

Indexed keywords

ABSORPTION; AUGER ELECTRON SPECTROSCOPY; FILM GROWTH; METALLORGANIC CHEMICAL VAPOR DEPOSITION; RUTHENIUM; SILICON WAFERS; SURFACE ROUGHNESS; TITANIUM NITRIDE; X RAY DIFFRACTION ANALYSIS;

DEPOSITION RATE; IODINE SOURCES; ROOT MEAN SQUARE (RMS); SURFACE MOBILITY;

IODINE COMPOUNDS;

EID: 3142753208     PISSN: 09481907     EISSN: None     Source Type: Journal    
DOI: 10.1002/cvde.200390000     Document Type: Article

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