Evaluation of precursors for chemical vapor deposition of ruthenium

Thin Solid Films

Volumn 376, Issue 1-2, 2000, Pages 73-81

  Smith, K C ^a   Sun, Y M ^a   Mettlach, N R ^a   Hance, R L ^b   White, J M ^a  

^a The University of Texas at Austin   (United States)

^b MOTOROLA INC   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

CONDUCTIVE FILMS; FILM GROWTH; FILM PREPARATION; METALLORGANIC CHEMICAL VAPOR DEPOSITION; RUTHENIUM; SCANNING ELECTRON MICROSCOPY; SUBSTRATES; THIN FILMS; TRANSMISSION ELECTRON MICROSCOPY; X RAY PHOTOELECTRON SPECTROSCOPY;

ORGANOMETALLIC PRECURSORS;

METALLIC FILMS;

EID: 0034318813     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0040-6090(00)01356-0     Document Type: Article

References (31)

1. Green M.L., Gross M.E., Papa L.E., Schnoes K.J., Brasen D. J. Electrochem. Soc.: Solid-State Sci. Technol. 132:1985;2677.
2. Viguié J.C., Spitz J. J. Electrochem. Soc. 122:1975;585.
3. J. Crosby, R.S. Hanley, US Patent # 4,250,210.
4. Boyd E.P., Ketchum D.R., Deng H., Shore S.G. Chem. Mater. 9:1997;1154.
5. Trent D.E., Paris B., Krause H.H. Inorg. Chem. 3:1964;1057.
6. Senzaki Y., McCormick F.B., Gladfelter W.L. Chem. Mater. 4:1992;747.
7. Senzaki Y., Gladfelter W.L., McCormick F.B. Chem. Mater. 5:1993;1715.
8. Berry A.D., Brown D.J., Kaplan R., Cukauskas E.J. J.Vac. Sci. Technol. A. 4:1986;215.
9. Rushman P., van Buuren G.N., Shiralian M., Pomeroy R.K. Organometallics. 2:1983;693.
10. Sun Y.-M., Endle J.P., Smith K., Whaley S., Mahaffy R., Ekerdt J.G., White J.M., Hance R.L. Thin Solid Films. 346:1999;100.
11. Macintyre J.E. Dictionary of Inorganic Compounds. 1992;Chapmans and Hall Chemical Database.
12. A.P. Humphries, S.A.R. Knox, J. Chem. Soc. Dalton Trans. (1975) 1710.
13. Y. Senzaki, D. Colombo, W.L. Gladfelter, F.B. McCormick, in: M.D. Allendorf, C. Bernard (Eds.), Chemical Vapor Deposition, Paris, France, September, 1997, Proceedings of the Electrochemical Society 97-25 (1997) 933.
14. Jeffries P.M., Wilson S.R., Girolami G.S. J. Organomet. Chem. 449:1993;203.
15. Jeon N.L., Nuzzo R.G. Langmuir. 11:1995;341.
16. A. Jain, J. Farkas, T.T. Kodas, M.J. Hampden-Smith, A.V. Gelatos, R. Marsh, C.J. Mogab, in: G.S. Higashi, E.A. Irene, T.Ohmi (Eds.), Surface Chemical Cleaning and Passivation for Semiconductor Processing, San Francisco, USA, April 13-15, 1993, Materials Research Society Symposium Proceeding 315 (1993) 933.
17. Auvert G., Pauleau Y., Tonneau D. J. Appl. Phys. 71:1992;4533.
18. C. Yang, S. Mehta, P. Davies, in: R.E. Howard, E.L. Hu, S. Namba, S.W. Pang (Eds.), Science and Technology of Microfabrication, Boston, U.S.A., December 4-5, 1986, Materials Research Society Symposium Proceeding 76 (1987) 247.
19. Ehlers A.W., Frenking G. Organometallics. 14:1995;423.
20. M. Menon, A. Pramanik, N. Bag, A. Chakravorty, J. Chem. Soc. Dalton Trans. (1995) 1417.
21. Lavaty T.G., Wikrent P., Drouin B.J., Kukolich S.G. J. Chem. Phys. 109:1998;9473.
22. Decker S.A., Klobukowski M. J. Am. Chem. Soc. 120:1998;9342.
23. Mayor-López M.J., Weber J. Chem. Phys. Lett. 281:1997;226.
24. Wafner C.D., Riggs W.M., Davis L.E., Moulder J.F. Muilenberg G.E. Phi Handbook of X-Ray Photoelectron Spectroscopy. 1979;Perkin-Elmer Corporation, Eden Prairie MN.
25. Goodman D.W., White J.M. Surf. Sci. 90:1979;201.
26. Kempter C.P., Nadler M.R. J. Chem. Phys. 33:1960;1580.
27. Kempter C.P. J. Chem. Phys. 41:1964;1515.
28. Shincho E., Egawa C., Naito S., Tamaru K. Surf. Sci. 149:1985;1.
29. Gustafson B.L., Lunsford J.H. J. Catal. 74:1982;393.
30. Ahn J.-H., Choi W.-Y., Lee W.-J., Kim H.-G. Jpn. J. Appl. Phys. 37:1998;284.
31. Mazhar, IslamRaja, Cappelli, McVittie, Saraswat, J. Appl. Phys. 70 (1991) 7137.