Chemical vapor deposition of amorphous ruthenium-phosphorus alloy films

Thin Solid Films

Volumn 515, Issue 13, 2007, Pages 5298-5307

  Shin, Jinhong ^a   Waheed, Abdul ^b   Winkenwerder, Wyatt A ^a   Kim, Hyun Woo ^a   Agapiou, Kyriacos ^b   Jones, Richard A ^b   Hwang, Gyeong S ^a   Ekerdt, John G ^a  

^a The University of Texas at Austin   (United States)

^b UNIVERSITY OF TEXAS AT AUSTIN   (United States)

Author keywords

Ab initio molecular dynamics simulation; Amorphous films; Chemical vapor deposition; Ruthenium alloy

Indexed keywords

ADSORPTION; CHEMICAL VAPOR DEPOSITION; COMPUTER SIMULATION; MOLECULAR DYNAMICS; POLYCRYSTALLINE MATERIALS; RUTHENIUM ALLOYS;

AB INITIO MOLECULAR DYNAMICS SIMULATION; AMORPHOUS RUTHENIUM PHOSPHORUS FILMS; CHEMICAL VAPOR DEPOSITION GROWTH;

AMORPHOUS FILMS;

EID: 33947728814     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.tsf.2007.01.002     Document Type: Article

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