Plasma diagnostics as a tool for process optimization: The case of microcrystalline silicon deposition

Plasma Physics and Controlled Fusion

Volumn 49, Issue 12 B, 2007, Pages

  Strahm, B ^a   Howling, A A ^a   Hollenstein, Ch ^a  

^a EPFL   (Switzerland)

Author keywords

[No Author keywords available]

Indexed keywords

DEPOSITION; FOURIER TRANSFORM INFRARED SPECTROSCOPY; MICROCRYSTALLINE SILICON; OPTICAL EMISSION SPECTROSCOPY; PHOTOVOLTAIC CELLS; SOLAR CELLS; THIN FILMS;

MICROCRYSTALLINE SILICON DEPOSITION; PHOTOVOLTAIC SOLAR CELLS; PLASMA COMPOSITION;

PLASMA DIAGNOSTICS;

EID: 36348935480     PISSN: 07413335     EISSN: 13616587     Source Type: Journal    
DOI: 10.1088/0741-3335/49/12B/S38     Document Type: Conference Paper

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