Process control of high rate microcrystalline silicon based solar cell deposition by optical emission spectroscopy

Thin Solid Films

Volumn 516, Issue 14, 2008, Pages 4633-4638

  Kilper, T ^a   van den Donker, M N ^a   Carius, R ^a   Rech, B ^b   Brauer G ^c   Repmann, T ^d  

^a FORSCHUNGSZENTRUM JÜLICH   (Germany)

^b HAHN MEITNER INSTITUT   (Germany)

^c FRAUNHOFER INSTITUTE FOR SURFACE ENGINEERING AND THIN FILMS IST   (Germany)

^d Applied Materials GmbH and Co KG   (Germany)

Author keywords

Microcrystalline Si PECVD; Optical emission spectroscopy; Thin film solar cells

Indexed keywords

MICROCRYSTALLINE SILICON; OPTICAL EMISSION SPECTROSCOPY; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION; PROCESS CONTROL; THIN FILMS;

MICROCRYSTALLINE SI PECVD; PLASMA EXCITATION FREQUENCY; THIN FILM SOLAR CELLS;

SILICON SOLAR CELLS;

EID: 42649140913     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.tsf.2007.05.098     Document Type: Article

References (21)

1. van den Donker M.N., Rech B., Finger F., Kessels W.M.M., and van de Sanden M.C.M. Appl. Phys. Lett. 87 (2005) 263503
2. van den Donker M.N., Schmitz R., Appenzeller W., Rech B., Kessels W.M.M., and van de Sanden M.C.M. Thin Solid Films 511-512 (2006) 562
3. M.N. van den Donker, T. Kilper, D. Grunsky, B. Rech, L. Houben, W.M.M. Kessels, M.C.M. van de Sanden, Thin Solid Films (in press) available onlinedoi:10.1016/j.tsf.2006.11.119.
4. Yamauchi Y., Takatsuka H., Kawamura K., Yamashita N., Fukagawa M., and Takeuchi Y. Tech. Rev. - Mitsubishi Heavy Ind. 42 3 (2005) 1
5. Roschek T., Rech B., Müller J., Schmitz R., and Wagner H. Thin Solid Films 451-452 (2004) 466
6. Rech B., Repmann T., van den Donker M.N., Berginski M., Kilper T., Hüpkes J., Calnan S., Stiebig H., and Wieder S. Thin Solid Films 511-512 (2006) 548
7. Repmann T., Appenzeller W., Sehrbrock B., Zahren C., and Rech B. Proceedings 19th Eur. Photovoltaic Solar Energy Conference, Paris, France, June 7-11 (2004) 1334
8. Kluth O., Schöpe G., Hüpkes J., Agashe C., Müller J., and Rech B. Thin Solid Films 442 (2003) 80
9. Rech B., Roschek T., Müller J., Wieder S., and Wagner H. Sol. Energy Mater. Sol. Cells 66 (2001) 267
10. Houben L., Luysberg M., Hapke P., Carius R., and Wagner H. Philos. Mag., A 77 1447 (1998)
11. Luysberg M., Scholten C., Houben L., Carius R., Finger F., and Vetterl O. Mater. Res. Soc. Symp. Proc. 164 (2001) 39
12. Smit C., van Swaaij R.A.C.M.M., Donker H., Petit A.M.H.N., Kessels W.M.M., and van de Sanden M.C.M. J. Appl. Phys. 94 (2003) 3582
13. Mai Y., Klein S., Carius R., Wolff J., Lambertz A., Finger F., and Geng X. J. Appl. Phys. 97 (2005) 114913
14. Vetterl O., Finger F., Carius R., Hapke P., Houben L., Kluth O., Lambertz A., Mück A., Rech B., and Wagner H. Sol. Energy Mater. Sol. Cells 62 (2000) 97
15. Rech B., Roschek T., Repmann T., Müller J., Schmitz R., and Appenzeller W. Thin Solid Films 427 (2003) 157
16. Yue G., Yan B., Ganguly G., Yang J., Guha S., and Teplin C.W. Appl. Phys. Lett. 88 (2006) 263507
17. Perrin J., Leroy O., and Bordage M.C. Contrib. Plasma Phys. 36 (1996) 3
18. Guo L., Kondo M., Fukawa M., Saitoh K., and Matsuda A. Jpn. J. Appl. Phys. 37 (1998) L1116
19. Fukuda Y., Sakuma Y., Fukai C., Fujimura Y., Azuma K., and Shirai H. Thin Solid Films 386 (2001) 256
20. Kosku N., Kurisu F., Takegoshi M., Takahashi H., and Miyazaki S. Thin Solid Films 435 (2003) 39
21. Tabuchi T., Takashiri M., and Mizukami H. Surf. Coat. Technol. 173 (2003) 243