From amorphous to microcrystalline silicon films prepared by hydrogen dilution using the VHF (70 MHz) GD technique

Journal of Non-Crystalline Solids

Volumn 227-230, Issue PART 1, 1998, Pages 68-72

  Kroll, U ^a   Meier, J ^a   Torres, P ^a   Pohl, J ^b   Shah, A ^a  

^a UNIVERSITY OF NEUCHÂTEL   (Switzerland)

^b UNIVERSITY OF KONSTANZ   (Germany)

Author keywords

a Si:H c Si:H structural transition; Amorphous and microcrystalline silicon films; Hydrogen bonding structure; Hydrogen dilution; VHF GD

Indexed keywords

AMORPHOUS SILICON; CRYSTAL DEFECTS; CRYSTAL GROWTH; CRYSTALLINE MATERIALS; CRYSTALLIZATION; FILM PREPARATION; GLOW DISCHARGES; HYDROGEN BONDS; SILANES; X RAY CRYSTALLOGRAPHY;

HYDROGEN DILUTION; MICROCRYSTALLINE SILICON FILMS; OPTICAL GAP;

SEMICONDUCTING SILICON;

EID: 0032068013     PISSN: 00223093     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0022-3093(98)00329-9     Document Type: Article

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