Time-resolved layer thickness behavior of microcrystalline and amorphous silicon samples after switching on a hydrogen/silane VHF plasma

Journal of Non-Crystalline Solids

Volumn 299-302, Issue PART 1, 2002, Pages 58-62

  Terasa, Ralf ^a   Albert, M ^a   Bartha, J W ^a   Brechtel, H ^a   Kottwitz, A ^a  

^a DRESDEN UNIVERSITY OF TECHNOLOGY   (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

AMORPHOUS SILICON; BOROSILICATE GLASS; COMPUTER SIMULATION; DEPOSITION; ETCHING; FILM GROWTH; PLASMA APPLICATIONS; SILANES; SUBSTRATES; THICKNESS MEASUREMENT;

VERY HIGH FREQUENCY PLASMA;

THIN FILMS;

EID: 17744412036     PISSN: 00223093     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0022-3093(01)01177-2     Document Type: Conference Paper

References (12)