A rigorous method to determine printability of a target layout

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 6521, Issue , 2007, Pages

  Yenikaya, Bayram ^a   Sezginer, Apo ^a  

^a Invarium Inc   (United States)

Author keywords

Hot spot; Litho friendly; OPC; Printability; RET

Indexed keywords

ETCHING; LITHOGRAPHY; PRINTED CIRCUITS; SEMICONDUCTOR DEVICE MODELS; WAVELENGTH;

HOT SPOTS; OPTICAL PROXIMITY CORRECTION (OPC); PRINTABILITY;

INTEGRATED CIRCUIT LAYOUT;

EID: 35048819511     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.711530     Document Type: Conference Paper

References (5)

1. K. Peter at al., "Litho-friendly Design (LfD) Methodologies Applied to Library Cells," Proc. SPIE vol. 6349, 63490E 1-12 (2006).
2. A. B. Kahng et al., "Fast Dual Graph Based Hotspot Detection," Proc SPIE vol. 6349, 63490H 1-8 (2006).
3. C. M. Sparrow, "On Spectroscopic Resolving Power," Astrophysical Journal, vol. 44, 76-86 (1916).
4. T. Brunner at al., "Impact of resist blur on MEF, OPC, and CD control," Proc. SPIE vol. 5377, 141-149 (2004)
5. J. A. Kong, Electromagnetic Wave Theory, Section 3.4, EMW Publishing, Cambridge, MA (2000)