Initialization for robust inverse synthesis of phase-shifting masks in optical projection lithography

Optics Express

Volumn 16, Issue 19, 2008, Pages 14746-14760

  Chan, Stanley H ^a   Wong, Alfred K ^b   Lam, Edmund Y ^a  

^a UNIVERSITY OF HONG KONG   (Hong Kong)

^b MAGMA DESIGN AUTOMATION   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

DYNAMIC PROGRAMMING; INTEGRATED CIRCUITS; LITHOGRAPHY; OPTICAL PROJECTORS; OPTICAL RESOLVING POWER; PHASE SHIFT; PHOTOLITHOGRAPHY;

ALTERNATING PHASE SHIFTING MASK; CRITICAL CHALLENGES; INTEGRATED CIRCUIT FABRICATION; MATHEMATICAL PROBLEMS; MINIMUM FEATURE SIZES; OPTICAL PROJECTIONS; PHASE-SHIFTING MASK; RESOLUTION ENHANCEMENT TECHNIQUE;

INVERSE PROBLEMS;

ALGORITHM; ARTICLE; COMPUTER ASSISTED DIAGNOSIS; ILLUMINATION; LASER; METHODOLOGY; PHOTOGRAPHY;

ALGORITHMS; IMAGE INTERPRETATION, COMPUTER-ASSISTED; LASERS; LIGHTING; PHOTOGRAPHY;

EID: 51849161519     PISSN: None     EISSN: 10944087     Source Type: Journal    
DOI: 10.1364/OE.16.014746     Document Type: Article

References (30)

1. J. Plummer, M. Deal, and P. Griffin, Silicon VLSI Technology -Fundamentals, Practice and Modeling (Prentice Hall, 2000).
2. C. A. Mack, "30 years of lithography simulation," Proc. SPIE 5754, 1-12 (2004).
3. F. Schellenberg, "Resolution enhancement technology: The past, the present, and extensions for the future," Proc. SPIE 5377, 1-20 (2004).
4. A. K.-K. Wong, Resolution enhancement techniques in optical lithography (SPIE Press, Bellingham, Washington, 2001).
5. K. Nashold and B. Saleh, "Image construction through diffraction-limited high-contrast imaging systems: An iterative approach," J. Opt. Soc. Am. A 2, 635-643 (1985).
6. B. Saleh and S. Sayegh, "Reductions of errors of microphotographic reproductions by optical corrections of original masks," Opt. Eng. 20, 781-784 (1981).
7. S. Sherif, B. Saleh, and R. Leone, "Binary image synthesis using mixed linear integer programming," IEEE Trans. Image Process. 4, 1252-1257 (1995).
8. Y. Liu and A. Zakhor, "Binary and phase-shifting image design for optical lithography," IEEE Trans. Semicond. Manuf. 5, 138-151 (1992).
9. Y. Liu and A. Zakhor, "Optimal binary image design for optical lithography," Proc. SPIE 1264, 410-412 (1990).
10. N. Cobb and A. Zakhor, "Fast sparse aerial image calculation for OPC," Proc. SPIE 2621, 534-545 (1995).
11. Y. C. Pati and T. Kailath, "Phase-shifting masks for microlithography automated design and mask requirements," J. Opt. Soc. Am. A 11, 2438-2452 (1994).
12. D. S. Abrams and L. Pang, "Fast inverse lithography technology," Proc. SPIE 6154, 534-542 (2006).
13. C. Hung, B. Zhang, E. Guo, L. Pang, Y. Liu, K. Wang, and G. Dai, "Pushing the lithography limit: Applying inverse lithography technology (ILT) at the 65nm generation," Proc. SPIE 6154, 61541M (2006).
14. L. Pang, Y Liu, and D. Abrams, "Inverse lithography technology (ILT): What is the impact to the photomask industry?" Proc. SPIE 6283, 62830X (2006).
15. A. Poonawala and P. Milanfar, "Prewarping techniques in imaging: Applications in nanotechnology and biotechnology," Proc. SPIE 5674, 114-127 (2005).
16. A. Poonawala and P. Milanfar, "OPC and PSM design using inverse lithography: A nonlinear optimization approach," Proc. SPIE textbf6154, 61543H (2006).
17. S. H. Chan, A. K. Wong, and E. Y. Lam, "Inverse synthesis of phase-shifting mask for optical lithography," in "OSA Topical Meeting in Signal Recovery and Synthesis," (2007), p. SMD3.
18. X. Ma and G. R. Arce, "Generalized inverse lithography methods for phase-shifting mask design," Opt. Express 15, 15066-15079 (2007).
19. J. W. Goodman, Statistical Optics (Wiley-Interscience, 1985).
20. J. W. Goodman, Introduction to Fourier Optics (Roberts and Company Publisher, Englewood, Colo, 2005), 3rd ed.
21. Y. Granik, "Solving inverse problems of optimal microlithography, " Proc. SPIE 5754, 506-526 (2004).
22. A. Poonawala and P. Milanfar, "Mask design for optical microlithography -an inverse imaging problem," IEEE Trans. Image Process. 16, 774-788 (2007).
23. S. H. Chan and E. Y. Lam, "Inverse image problem of designing phase shifting masks in optical lithography," in "IEEE International Conference on Image Processing," (2008).
24. P. E. Gill, W. Murray, and M. H.Wright, Practical optimization (Academic Press, London, 1986).
25. W. Rudin, Principles of Mathematical Analysis (McGraw-Hill, 1976).
26. M. Minoux, Mathematical programming theory and algorithms (John Wiley and Sons. Chichester, 1986).
27. P. Berman, A. Kahng, D. Vidhani, H. Wang, and A. Zelikovsky, "Optimal phase conflict removal for layout of dark field alternating phase shifting masks," IEEE Trans. Computer-Aided Design of Integrated Circuits and Systems 19, 175-187 (2000).
28. A. Moniwa and T. Terasawa, "Heuristic method for phase-conflict minimization in automatic phase-shift mask design," Jpn. J. Appl. Phys. 34, 6584-6589 (1995).
29. L. G. Shapiro and G. C. Stockman, Computer Vision (Prentice Hall, 2001).
30. D. Halliday, R. Resnick, and K. S. Krane, Physics, (John Wiley and Sons, New York, 2002), 2nd ed., Vol. 2,