If it moves, simulate it!

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 6924, Issue , 2008, Pages

  Neureuther, Andrew ^a  

^a UNIVERSITY OF CALIFORNIA   (United States)

Author keywords

Defect; Electromagnetic; Illumination; Image; Interferometric; Modeling; Monitor; Partial coherence; Profile evolution; Resist; Simulation

Indexed keywords

ANALYSIS TECHNIQUES; CIRCUIT DESIGNS; DILL MODEL; GROWTH AREAS; IN PHASE (IP); INTENSITY IMBALANCE; OPTICAL MICRO LITHOGRAPHY; PARADIGM SHIFTS; PARTIAL-COHERENCE; PHYSICAL MODEL (PM); SELF-TESTING; SYNERGY (CO); THIN-FILM MEASUREMENT;

ARCHITECTURAL DESIGN; HEALTH CARE; LITHOGRAPHY; MATHEMATICAL MODELS; MEASUREMENTS;

MODELS;

EID: 45449088898     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.782310     Document Type: Conference Paper

References (64)

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5. F.H. Dill, A. R. Neureuther, J.A. Turtle and E.J. Walker, "Modeling Projection printing of Positive Photoresists," IEEE Trans. Electron Devices, ED-22, No. 7, pp. 456-464, 1975.
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28. G. McIntyre, J. Holwill and A. R. Neureuther, Screening layouts for high-numerical aperture and polarization effects using pattern matching, Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures ~ November 2005 - Volume 23, Issue 6, pp. 2646-2652
29. F. Gennari and A. Neureuther, "A Pattern Matching System for Linking TCAD and EDA", IDQED 2004: 165-170.
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31. W.G. Oldham, A.R. Neureuther, C. Sung, J.L. Reynolds, and S.N. Nandgaonkar, "A General Simulator for VLSI Lithography and Etching Processes: Part II-Application to Deposition and Etching", IEEE on Trans, on Electron Devices, Vol.ED-27, No.8, pp. 1455-1459, August, 1980.
32. R.E. Jewett, P.I. Hagouel, A.R. Neureuther, and T. Van Duzer, "Line-Profile Resist Development Simulation Techniques", Polymer Engineering and Science, Vol.17, No.6, pp. 381-384, June 1977.
33. M.A. Grimm, K. Lee and A.R. Neureuther, "SIMPL-1 (SIMulated Profiles from the Layout - version 1)", IEDM Technical Digest, pp. 255-258, 1983.
34. K. Lee, Y. Sakai and A.R. Neureuther, "Topography Dependent Electrical Parameter Simulation for VLSI Design," IEEE Trans. Elec. Dev., Vol. 30, pp. 1469-1474, November 1983.
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36. D.M. Newmark and A.R. Neureuther, "Phase-Shifting Mask Design Tool," SPIE Vol. 604, pp. 226-235, 1991.
37. M.S. Yeung, D. Lee, R. Lee, and A.R. Neureuther, "Extension of the Hopkins' Theory of partially Coherent Imaging to Include Thin-Film Interference Effects," SPIE Vol. 1927, pp. 452-463, 1993.
38. J. Gamelin, R. Guerrieri, and A.R. Neureuther, "Exploration of Scattering from Topography with Massively Parallel Computers," J. Vac. Sci. Technol. B., Vol. 7, No. 6, pp. 1984-1990, Nov/Dec 1989.
39. The SIMD machines did work well for shot noise development. R.G. Guerrieri and A.R. Neureuther, "Simulation of Microcrack Effects in Dissolution of Positive Resist Exposed by X-Ray Lithography," IEEE Trans. CAD, pp. 755-764, July, 1988.
40. K. Adam and A.R. Neureuther, "Methodology for accurate and rapid simulation of large arbitrary 2D layouts of advanced photomasks, Proc. SPIE 4562-118.
41. M. Lam and A. Neureuther, " Fast simulation methods for defective EUV mask blank inspection," SPIE Vol. 5567, pp. 741-750, Dec. 2004.
42. K.K.H. Toh, A.R. Neureuther and E.W. Scheckler, "Three-Dimensional Simulation of Optical Lithography," SPIE Vol. 1463, pp. 356-367, March, 1991.
43. R.H. Wang, A. Gabara and A.R. Neureuther "BTU - Berkeley Topography Utilities for Linking Topography and Impurity Diffusion Simulations," NUPAD-IV Technical Digest, pp. 225-230, 1992.
44. J.J. Heimsen, E.W. Scheckler, A.R. Neureuther and C.H. Sequin "An Efficient Loop Detection and Removal Algorithm for 3D Surface-Based Lithography Simulation," NUPAD-IV Technical Digest, pp. 3-8, 1992.
45. A. S. Wong and A.R. Neureuther, "The Intertool Profile Interchange Format: A Technology CAD Environment Approach," IEEE Trans CAD, Vol. 10, No. 9, pp. 1157-1162, Sept, 1991.
46. E.W. Scheckler, A.S. Wong, R.H. Wang, J.R. Camagna, A.R. Neureuther, G. Chin and R.W. Dutton, "A Utility-Based Integrated Process Simulation System," IEEE Trans. on CAD, Vol. 11, No. 7, pp. 911-920, July 1992.
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48. A.R. Neureuther, R.H. Wang, J.J. Heimsen, J.F. Seiler, E.W. Scheckler, R. Gunturi, and Rex Winterbottom, "3-D topography simulation using surface representation and central utilities," pp. 57-76, 3-Dimensional process Simulation, Ed. J. Lorentz, Springer-Verlag, 1995.
49. John H. Sefler and Andrew R. Neureuther, "Extracting solid conductors from a single triangulated surface representation for interconnect analysis," IEEE Trans. Semiconductor Manufacturing, Vol. 9, No. 1, pp. 82-86, Sept. 1995.
50. A.R. Neureuther, R.H. Wang, J.J. Heimsen, J.F. Sefler, E.W. Scheckler, R. Gunturi, and Rex Winterbottom, "3-D topography simulation using surface representation and central utilities," pp. 57-76, 3-Dimensional process Simulation, Ed. J. Lorentz, Springer-Verlag, 1995.
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52. C. Hsu, R. Yang, J. Cheng, P. Chien, V. Wen, A. R. Neureuther, "Lithography analysis using virtual access (LAVA) web resource," Proc. SPIE, Vol. 3334, pp. 197-201 (1998).
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55. John P. Stirniman and Michael L. Reiger, "Fast Proximity Correction with zone Sampling", Proc. SPIE Vol. 2197, pp. 294-301 (May 1994).
56. R. Socha, D. Van Den Broeke, S. Hsu, J. Fung Chen, T. Laidig, N. Corcoran, U. Hollerbach, K. E. Wampler, X. Shi and W. Conley, "Contact Hole Reticle Optimization by Using Interference Mapping Lithography (IMLTM)," Proc. SPIE 5377, 223-254 (2004).
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58. Marshal A. Miller, "Characterization and Monitoring of Edge Effects in Photomasks," SPIE BACUS 07
59. Jing Xue, Costas Spanos, Andrew Neureuther, "Printing assessment of parameter specific phase-shift-mask patterns for scatterometry monitoring," SPIE 6922-63
60. Gabor AH, et al, "Improving the Power-Performance of Multicore Processors Through Optimization of Lithography and Thermal Processing", SPIE, Volume 6521-18 (2007)
61. Wojtek J. Poppe, Luigi Capodieci, Andrew Neureuther, "Platform for collaborative DFM", Proc. SPIE Vol. 6156, 61560E, Mar 2006.
62. Lynn T. Wang, Wojtek J. Poppe, Liang-Teck Pang, Andrew Neureuther, Elad Alon, Borivoje Nikolic, "Hypersensitive parameter-identifying ring oscillators for lithography process monitoring," SPIE 6925-24
63. Eric Chin, Andrew Neureuther, "Modeling timing across the lithographic process window," SPIE 6925-22
64. Juliet A. Rubinstein, Andrew R. Neureuther, "Post-decomposition assessment of double-patterning layouts," SPIE 6924-23