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Volumn 10, Issue 1, 1997, Pages 62-74

Exploiting structure in fast aerial image computation for integrated circuit patterns

Author keywords

[No Author keywords available]

Indexed keywords

COMPUTATIONAL METHODS; IMAGE ANALYSIS; IMAGING SYSTEMS; INTEGRATED CIRCUIT MANUFACTURE; MASKS; NONLINEAR EQUATIONS; PHOTOLITHOGRAPHY;

EID: 0031075964     PISSN: 08946507     EISSN: None     Source Type: Journal    
DOI: 10.1109/66.554485     Document Type: Article
Times cited : (61)

References (10)
  • 2
    • 0026980816 scopus 로고
    • Derivation and simulation of higher numerical aperture scalar aerial images
    • D. Cole, E. Barouch, U. Hollerbach, and S. Orszag, "Derivation and simulation of higher numerical aperture scalar aerial images," Jpn. J. Appl. Phys., vol. 31, p. 4110, 1992.
    • (1992) Jpn. J. Appl. Phys. , vol.31 , pp. 4110
    • Cole, D.1    Barouch, E.2    Hollerbach, U.3    Orszag, S.4
  • 3
    • 0028515483 scopus 로고
    • Phase-shifting masks for microlithography: Automated design and mask requirements
    • Y. C. Pati and T. Kailath, "Phase-shifting masks for microlithography: Automated design and mask requirements," J. Opt. Soc. Amer. A, vol. 11, no. 9, pp. 2438-2453, 1994.
    • (1994) J. Opt. Soc. Amer. A , vol.11 , Issue.9 , pp. 2438-2453
    • Pati, Y.C.1    Kailath, T.2
  • 10
    • 84957497335 scopus 로고
    • Identifying and monitoring effects of lens aberrations in projection printing
    • Mar.
    • K. H. Toh and A. R. Neureuther, "Identifying and monitoring effects of lens aberrations in projection printing," in Proc. SPIE Microlithography Conf., Mar. 1987, pp. 202-209.
    • (1987) Proc. SPIE Microlithography Conf. , pp. 202-209
    • Toh, K.H.1    Neureuther, A.R.2


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.