Hotspot Detection on Post-OPC Layout Using Full Chip Simulation Based Verification Tool: A Case Study with Aerial Image Simulation

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 5256, Issue 2, 2003, Pages 919-925

  Kim, Juhwan ^a   Fan, Minghui ^a  

^a SYNOPSYS INC   (United States)

Author keywords

Hotspots; Lithography; Optical Proximity Correction; Post OPC verification

Indexed keywords

CALIBRATION; COMPUTER SIMULATION; COSTS; DATABASE SYSTEMS; ERROR ANALYSIS; IMAGE PROCESSING; MICROPROCESSOR CHIPS; OPTICAL RESOLVING POWER; PHOTOLITHOGRAPHY;

HOTSPOTS; OPTICAL PROXIMITY CORRECTIONS (OPC); POST-OPC VERIFICATION;

MASKS;

EID: 1842474918     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.517364     Document Type: Conference Paper

References (4)

1. rd Annual BACUS Symposium, 2003.
2. rd Annual BACUS Symposium, 2003.
3. rd Annual BACUS Symposium, 2001
4. M. L. Rieger, J. P. Stirniman, "Proximity Correction System for Wafer Lithography", U.S. Ptent 6,081,658, issued June 27, 2000