Surface modification of polyhedral oligomeric silsesquioxane block copolymer films by 157 nm laser light

Journal of Applied Physics

Volumn 105, Issue 11, 2009, Pages

  Sarantopoulou, Evangelia ^a   Kollia, Zoe ^a   Cefalas, Alkiviadis Constantinos ^a   Siokou, Ageliki Elina ^b   Argitis, Panagiotis ^c   Bellas, Vassilios ^c   Kobe, Spomenka ^d  

^a INSTITUTE OF BIOLOGY   (Greece)

^b INSTITUTE OF COMPUTER SCIENCE   (Greece)

^c INSTITUTE OF NANOSCIENCE AND NANOTECHNOLOGY   (Greece)

^d JO EF STEFAN INSTITUTE   (Slovenia)

Author keywords

[No Author keywords available]

Indexed keywords

157 NM LASER; ABSORBANCE; ATOMIC FORCE; BLOCK COPOLYMER FILMS; C-H BOND; CHEMICAL CHANGE; CHEMICALLY MODIFIED; GLASSIFICATION; LASER IRRADIATIONS; LOW-ORBIT SATELLITES; PENETRATION DEPTH; POLYHEDRAL OLIGOMERIC SILSESQUIOXANE; SURFACE HARDENING; SURFACE HARDNESS; SURFACE MODIFICATION; THIN SURFACE LAYER; VACUUM ULTRAVIOLETS; VUV IRRADIATION; VUV PHOTON; VUV RADIATION; YOUNG'S MODULUS;

ABSORPTION SPECTROSCOPY; ATOMIC FORCE MICROSCOPY; ATOMIC SPECTROSCOPY; BLOCK COPOLYMERS; BOND STRENGTH (CHEMICAL); COPOLYMERIZATION; DEGRADATION; IRRADIATION; LIGHT; MASS SPECTROMETRY; MULTIPHOTON PROCESSES; PHOTODEGRADATION; PHOTODISSOCIATION; PHOTOLYSIS; PHOTONS; POLYMERS; SPECTRUM ANALYSIS; ULTRAVIOLET PHOTOELECTRON SPECTROSCOPY; X RAY PHOTOELECTRON SPECTROSCOPY;

CHEMICAL MODIFICATION;

EID: 67649550911     PISSN: 00218979     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.3131822     Document Type: Article

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