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Volumn 109, Issue 35, 2005, Pages 16676-16683

Chemical alteration of poly(tetrafluoroethylene) TFE Teflon induced by exposure to electrons and inert-gas ions

Author keywords

[No Author keywords available]

Indexed keywords

ATOMIC OXYGEN (AO); ION FLUXES; STEADY-STATE; VACUUM ULTRAVIOLET (UAV) RADIATION;

EID: 25444436276     PISSN: 15206106     EISSN: None     Source Type: Journal    
DOI: 10.1021/jp051430k     Document Type: Article
Times cited : (4)

References (41)
  • 1
    • 25444462297 scopus 로고    scopus 로고
    • FEP Teflon, TFE Teflon, Tefzel, Tedlar, and Kapton are registered trademark names by E.I. duPont Nemours & Co., Inc.
    • FEP Teflon, TFE Teflon, Tefzel, Tedlar, and Kapton are registered trademark names by E.I. duPont Nemours & Co., Inc.
  • 35
    • 0008772860 scopus 로고
    • Czandarna, A. W., Ed.; Elsevier Scientific Publishing Co.: Amsterdam, The Netherlands
    • Joshi, A.; Davis, L. E.; Palmberg, P. W. In Methods of Surface Analysis; Czandarna, A. W., Ed.; Elsevier Scientific Publishing Co.: Amsterdam, The Netherlands, 1975; p 160.
    • (1975) Methods of Surface Analysis , pp. 160
    • Joshi, A.1    Davis, L.E.2    Palmberg, P.W.3
  • 38
    • 0040894310 scopus 로고
    • Depth profiling
    • Hubbard, A. J., Ed.; CRC Press: Boca Raton, FL; Chapter 6
    • Hoflund, G. B. Depth Profiling. In CRC Handbook of Surface Imaging and Visualization; Hubbard, A. J., Ed.; CRC Press: Boca Raton, FL, 1995; Chapter 6, pp 63-76.
    • (1995) CRC Handbook of Surface Imaging and Visualization , pp. 63-76
    • Hoflund, G.B.1


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.