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Surface and Interface Analysis

Volumn 40, Issue 3-4, 2008, Pages 400-403

Surface modification of polymeric thin films with vacuum ultraviolet light

(6) Sarantopoulou, E a Kovac J b Kollia, Z a Raptis, I c Kobe, S b Cefalas, A C a

a THEORETICAL AND PHYSICAL CHEMISTRY INSTITUTE (Greece)

b JO EF STEFAN INSTITUTE (Slovenia)

c INSTITUTE OF MICROELECTRONICS (Greece)

Author keywords

157 nm; AFM; Etching; Interfaces; PMMA; VUV chemical modification; VUV polymer surface modification; XPS

Indexed keywords

CHEMICAL MODIFICATION; ETCHING; POLYMER FILMS; SURFACE MORPHOLOGY; SURFACE ROUGHNESS; ULTRAVIOLET RADIATION; VACUUM;

ELONGATED PATTERNS; POLYMER SURFACE MODIFICATION; POLYMERIC THIN FILMS;

THIN FILMS;

EID: 42449099323 PISSN: 01422421 EISSN: 10969918 Source Type: Journal
DOI: 10.1002/sia.2776 Document Type: Conference Paper

Times cited : (19)

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