Current trends in 157 nm dry lithography

Applied Surface Science

Volumn 247, Issue 1-4, 2005, Pages 577-583

  Cefalas, A C ^a  

^a INSTITUTE OF BIOLOGY   (Greece)

Author keywords

157 nm lithography; AFM; Outgassing; Polymers

Indexed keywords

ABSORPTION SPECTROSCOPY; ATOMIC FORCE MICROSCOPY; DEFECTS; DEGASSING; FLUORINE; LASER APPLICATIONS; MATHEMATICAL MODELS; MOLECULAR DYNAMICS; OPTICAL SYSTEMS; THIN FILMS;

157 NM LITHOGRAPHY; LINE EDGE ROUGHNESS; MONOMER DISSOCIATION; VIBRATION EXCITATION;

LITHOGRAPHY;

EID: 19744367138     PISSN: 01694332     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.apsusc.2005.01.139     Document Type: Article

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