Evaluation of siloxane and polyhedral silsesquioxane copolymers for 157 nm lithography

Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures

Volumn 20, Issue 6, 2002, Pages 2902-2908

  Bellas, V ^a,b   Tegou, E ^a   Raptis, I ^a   Gogolides, E ^a   Argitis, P ^a   Iatrou, H ^b   Hadjichristidis, N ^b   Sarantopoulou, E ^c   Cefalas, A C ^c  

^a INSTITUTE OF MICROELECTRONICS   (Greece)

^b UNIVERSITY OF ATHENS   (Greece)

^c NHRF   (Greece)

Author keywords

[No Author keywords available]

Indexed keywords

IMAGING CHEMISTRY; PATTERN TRANSFER PROPERTIES; POLYHEDRAL SILSESQUIOXANE COPOLYMERS; SILOXANE;

ACRYLICS; FLUORINE CONTAINING POLYMERS; LITHOGRAPHY; MONOMERS; OLIGOMERS; OPTIMIZATION; POLYMERIZATION; SUBSTITUTION REACTIONS; SURFACE ROUGHNESS; SYNTHESIS (CHEMICAL); THICKNESS MEASUREMENT; TRANSPORT PROPERTIES;

COPOLYMERS;

EID: 0036883181     PISSN: 0734211X     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.1526358     Document Type: Article

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