Modification of polyethylene by VUV irradiation in the presence of trimethylsilane and oxygen

Macromolecular Chemistry and Physics

Volumn 209, Issue 12, 2008, Pages 1232-1239

  Daschiel, Ute ^a   Spanring, Julia ^b   Ebel, Maria F ^c   Svagera, Robert ^c   Schröttner, Hartmuth ^b   Kern, Wolfgang ^d  

^a POLYMER COMPETENCE CENTER LEOBEN GMBH   (Austria)

^b GRAZ UNIVERSITY OF TECHNOLOGY   (Austria)

^c VIENNA UNIVERSITY OF TECHNOLOGY   (Austria)

^d UNIVERSITY OF LEOBEN   (Austria)

Author keywords

Photochemistry; Polyethylene (PE); Surface modification

Indexed keywords

ANGLE MEASUREMENT; IRRADIATION; MICROSCOPIC EXAMINATION; OXYGEN; POLYMERS; POLYOLEFINS; SILANES; SILICON; SURFACE TREATMENT; THERMOPLASTICS;

BARRIER LAYERS; ELECTRON MICROSCOPY.; ENERGY SURFACES; LDPE SURFACES; PHOTOCHEMISTRY; SURFACE MODIFICATION; SURFACE MODIFICATIONS; TRI METHYL SILANES; VUV IRRADIATIONS;

CHEMICAL MODIFICATION;

EID: 55349103786     PISSN: 10221352     EISSN: 15213935     Source Type: Journal    
DOI: 10.1002/macp.200800034     Document Type: Article

References (33)

1. C.-M. Chan, "Polymer Surface Modification and Characterization", Carl Hanser Verlag, Munich 1994.
2. C.-M. Chan, T.-M. Ko, H. Hiraoka, Surf. Sci. Rep. 1996, 24, 1.
3. I. Mathieson, R. H. Bradley, Int. J. Adhes. Adhes. 1996, 16, 29.
4. N. Chanunpanich, A. Ulman, Y. M. Stzhemechny, S. A. Schwarz, A. Janke, H. G. Braun, T. Kratzmüller, Langmuir 1999, 15, 2089.
5. T. Kavc, W. Kern, M. F. Ebel, R. Svagera, P. Pölt, Chem. Mater. 2000, 12, 1053.
6. Z.-Y. Zhang, I. W. Boyd, H. Esrom, Surf. Interf. Anal. 1996, 24, 718.
7. U. Kogelschatz, H. Esrom, Z.-Y. Zhang, I. W. Boyd, Appl. Surf. Sci. 2000, 168, 29.
8. J. Heitz, H. Niino, A. Yabe, Jpn. J. Appl. Phys. 1996, 35, 4410.
9. A. Hozumi, A., H. Inagaki, T. Kameyama, J. Colloid Interface Sci. 2004, 278, 383.
10. V.-M. Graubner, R. Jordan, O. Nuyken, B. Schnyder, T. Lippert, R. Kötz, A. Wokaun, Macromolecules 2004, 37, 5936.
11. A. Hozumi, H. Inagai, Y. Yokogawa, T. Kameyama, Thin Solid Films 2003, 437, 89.
12. A. Hozumi, T. Masuda, H. Sugimura, T. Kameyama, Langmuir 2003, 19, 7573.
13. J. Spanring, C. Buchgraber, M. F. Ebel, R. Svagera, W. Kern, Macromol. Chem. Phys. 2005, 206, 2248.
14. J. Spanring, C. Buchgraber, M. F. Ebel, R. Svagera, W. Kern, Polymer 2006, 47, 156.
15. M. A. Nay, G. N. C. Woodall, O. P. Strausz, H. E. Gunning, J. Am. Chem. Soc. 1965, 87, 179.
16. R. Walsh, Acc. Chem. Res. 1981, 14, 246.
17. C. Chatgilialoglu, Chem. Rev. 1995, 95, 1229.
18. M. Morra, E. Occhiello, F. Garbassi, J. Appl. Polym. Sci. 1993, 48, 1331.
19. W. Hanke, H. Ebel, M. F. Ebel, A. Jablonski, K. Hirokawa, J. Electron. Spectrosc. Relat. Phenom. 1986, 40, 241.
20. Command Reference Manual, version 4.10, Digital Instruments Inc., 1995.
21. G. Ström, M. Frederiksson, P. Stenius, J. Colloid Interf. Sci. 1987, 119, 352.
22. D. K. Owens, R. C. Wendt, J. Appl. Polym. Sci. 1969, 13, 1741.
23. J. F. Rabek, "Photodegradation of Polymers, Physical Characteristics and Applications", Springer, Berlin 1996.
24. F.-E. Truica-Marasescu, M. R. Wertheimer, Macromol Chem. Phys. 2005, 206, 744.
25. F.-E. Truica-Marasescu, S. Guimond, M. R. Wertheimer, Nucl. Instr. Meth. Phys. Res. B 2003, 208, 294.
26. F. Truica-Marasescu, M. R. Wertheimer, J. Appl. Polym. Sci. 2004, 91, 3886.
27. A. G. Alexander, O. P. Strausz, Chem. Phys. Lett. 1972, 13, 608.
28. Y. Harada, J. N. Murrell, H. H. Sheena, Chem. Phys. Lett 1968, 1, 595.
29. M. Ahmed, P. Potzinger, H. G. Wagner, J. Photochem. Photobiol A 1995, 86, 33.
30. A. Watanabe, K. Osato, S. Ninomiya, M. Mukaida, T. Tsunoda, Y. Imai, Thin Solid Films 1996, 274, 70.
31. A. M. Brown, M. T. Maurette, E. Oliveros, "Photochemical Technology, Wiley. Chichester 1991, p. 346.
32. C. D. Wagner, W. M. Riggs, L. E. Davis, J. F. Moulder, G. E. Muilenberg, "Handbook of X-Ray Photoelectron Spectroscopy", Physical Electronics Division, Appendix B. Eden Prairie, Perkin Elmer Corporation, 1979.
33. G. Socrates, "Infrared Characteristic Group Frequencies" , John Wiley & Sons, Chichester 1998.