The challenges of 157 nm nanolithography: Surface morphology of silicon-based copolymers

Materials Science and Engineering C

Volumn 23, Issue 6-8, 2003, Pages 995-999

  Sarantopoulou, E ^a   Kollia, Z ^a   Kocevar K ^b   Musevic I ^b   Kobe, S ^b   Drazic G ^b   Gogolides, E ^c   Argitis, P ^c   Cefalas, A C ^a  

^a INSTITUTE OF BIOLOGY   (Greece)

^b JO EF STEFAN INSTITUTE   (Slovenia)

^c INSTITUTE OF NANOSCIENCE AND NANOTECHNOLOGY   (Greece)

Author keywords

157 nm; Block copolymers; Lithography; Nano structure; Polymer

Indexed keywords

ABSORPTION; ATOMIC FORCE MICROSCOPY; COMPOSITION; DEGASSING; FABRICATION; LITHOGRAPHY; SILICON; SURFACE ROUGHNESS;

HOMOPOLYMER;

COPOLYMERS;

NANOTECHNOLOGY;

EID: 0344256481     PISSN: 09284931     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.msec.2003.09.072     Document Type: Article

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