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Applied Physics A: Materials Science and Processing

Volumn 92, Issue 4, 2008, Pages 877-881

Influence of photoexcitation pathways on the initiation of ablation in poly (methyl methacrylate)

(3) Prasad, Manish a Conforti, Patrick F a Garrison, Barbara J a

a PENNSYLVANIA STATE UNIVERSITY (United States)

Author keywords

[No Author keywords available]

Indexed keywords

CHEMICAL ENGINEERING; CHEMICAL REACTIONS; CHLORINE COMPOUNDS; DECOMPOSITION; DYNAMICS; ESTERS; GRAFTING (CHEMICAL); HEATING; LASER ABLATION; LASERS; MOLECULAR DYNAMICS; PHOTOEXCITATION; POLYMERS; PULSED LASER DEPOSITION; QUANTUM CHEMISTRY; REACTION KINETICS; SUBSTRATES; SYNTHESIS (CHEMICAL);

CHEMICAL DECOMPOSITION; CHEMICAL PROCESSING; CRITICAL NUMBERS; DIRECT BONDS; FRAGMENTATION PROCESSES; GASEOUS MOLECULES; GASEOUS PRODUCTS; LASER-INDUCED HEATING; LOSS OF STRENGTH; MOLECULAR DYNAMICS SIMULATIONS; MONTE CARLO; PHOTON ENERGIES; PHOTOTHERMAL ABLATION; POLY-METHYL METHACRYLATE; POLYMERIC SUBSTRATES; PROCESSING CONDITIONS; REACTION SCHEMES; TWO-STEP MODEL; UV IRRADIATIONS;

ABLATION;

EID: 49449084471 PISSN: 09478396 EISSN: 14320630 Source Type: Journal
DOI: 10.1007/s00339-008-4570-7 Document Type: Article

Times cited : (8)

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