Surface segregation of photoresist copolymers containing polyhedral oligomeric silsesquioxanes studied by x-ray photoelectron spectroscopy

Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures

Volumn 22, Issue 5, 2004, Pages 2526-2532

  Eon, D ^a   Cartry, G ^a   Fernandez, V ^a   Cardinaud, C ^a   Tegou, E ^b   Bellas, V ^b   Argitis, P ^b   Gogolides, E ^b  

^a INSTITUT DES MATÉRIAUX JEAN ROUXEL   (France)

^b INSTITUTE OF NANOSCIENCE AND NANOTECHNOLOGY   (Greece)

Author keywords

[No Author keywords available]

Indexed keywords

ABSORPTION; CONCENTRATION (PROCESS); GLASS TRANSITION; LITHOGRAPHY; OPTIMIZATION; PRECIPITATION (CHEMICAL); SILICON; SYNTHESIS (CHEMICAL); X RAY PHOTOELECTRON SPECTROSCOPY;

FLUORINATION; POLYHEDRAL OLIGOMERIC SILSESQUIOXANE (POSS); POLYMERIZATION INITIATOR; SIGNAL QUANTIFICATION;

POLYMERS;

EID: 9744238853     PISSN: 10711023     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.1798871     Document Type: Article

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